Quantum X Shape Two Photon Maskless Lithography System

NegotiableUpdate on 01/16

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

The Quantum X shape two-photon maskless lithography system is a truly versatile model. Based on two-photon aggregation technology, this system is not only the best model for rapid prototyping production, but also suitable for large-scale production of 2.5D and 3D shapes based on any sub micron precision on the wafer. The new Quantum X shape can print any 2.5D and 3D micro nano structure for you, providing true design freedom. This system can achieve various high aspect ratio structures for you.

Product Details

As a leading 3D printing system in its class

Quantum X shape Can print any shape, with a minimum size of 100nm and surface roughness(Ra)Less than 5nm, with a maximum area of up to 25cm

The printing system with automatic dispensing module function can achieve an overnight efficiency of up to 200 feature structures.

Universal high-performance two-photon polymer material, suitable for polymer and glass printing.

Reshaping precision.

As recognized by the industryNanoscribeThe second-generation machining system of Quantum X platform launched by the company,Quantum X Shape Two Photon Maskless Lithography SystemHaving expertise in the field of 3D micro nano processingAmazing heightAccuracy, comparable toNanoscribeBreakthrough in the application of surface structure by the companyTwo-photon grayscale lithography(2GL ®)。 brand newQuantum X shapeThe high precision relies on its highest voxel modulation ratio and ultra-fine processing mesh, thereby achieving sub voxel size control. In addition, benefiting fromTwo-photon grayscale lithographyFine tuning of voxels, this system can achieve ultra smooth surface microstructure fabrication while maintaining high-precision shape control.

Reshaping output.

Quantum X Shape Two Photon Maskless Lithography SystemNot only applied in biomedical and micro optics MEMS、 The ideal tool for rapid prototyping of devices in microchannels, surface engineering, and many other fields has also become a simple tool for mass production of small structural units based on wafers.

Reshaping usability.

The practicality is greatly improved by integrating touch screen control to print files through the system. Through the built-in nanoConnectX software of the system, remote monitoring of printed files and multi-user usage configuration can be carried out to promote industrial standardization and efficiency based on wafer batch production.

Main features:

*Nanoscale printing: feature scale control in any spatial direction, up to 100nm

*High speed 3D micro nano machining with ultrafast voxel control and 100nm processing grid

*Trajectory accuracy at the fastest scanning speed ensured by mirror track control

*High precision laser energy control and positioning ensured by automated self calibration path

*Wide selection of substrates and silicon wafers up to 6 inches

*Industrial mass production: overnight production of 200 standard mesoscale structures

*Touch screen and remote control functions that ensure practicality and user experience

*Rapid prototyping, high precision, high design freedom, and simple and clear workflow

*Industrial validation of wafer level mass production

*Universal and specialized printing materials

*Compatible with independent and third-party printing materials