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E-mail
wu.xiaoyu@ym-qbt.com
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Phone
19906051395
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Address
Anren Industrial Park, 1068-6 Jimei North Avenue, Jimei District, Xiamen City
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Xiamen Yunmao Technology Co., Ltd
Powder ALD manufacturer
NegotiableUpdate on 01/29
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- Nature of the Manufacturer
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Overview
Powder ALD manufacturer (Atomic layer deposition) is a technology that forms a deposition film by alternately introducing gas-phase precursor pulses into the reaction chamber and chemically adsorbing and reacting on the deposition substrate. It has self limitation and self saturation. The main application of atomic layer deposition technology is to deposit high-precision, pinhole free, and highly conformal nanofilms on substrates of various sizes and shapes.
Product Details
1Powder ALD manufacturerCore parameters:
Price range: 1 million to 2 million
Origin category: Domestic Atomic Layer Deposition System (ALD)
Substrate size: 10g-1000g powder
Process temperature: RT-300 ℃
Number of precursors: 2 sets of reaction gases, 8 sets of liquid or solid reaction precursors
Weight: 300KG
Size (WxHxD): 1150 * 1030 * 1850mm
Uniformity: Achieve uniform atomic layer coating on the surface of the powder, with coating uniformity<3%
2、 Atomic layer deposition is a technique that forms a deposited film by alternately introducing gas-phase precursor pulses into a reaction chamber and chemically adsorbing and reacting on the deposited substrate. It has self limitation and self saturation. The main application of atomic layer deposition technology is to deposit high-precision, pinhole free, and highly conformal nanofilms on substrates of various sizes and shapes.
3、 Powder ALD manufacturer product description:
GM series automatic powder atomic layer deposition equipment of Xiamen Yunmao Technology Company can realize uniform and controllable atomic layer deposition or molecular layer deposition growth on micro nano powder. The reaction chamber of GM1000 can automatically run ALD (atomic layer deposition) or MLD (molecular layer deposition). The equipment is equipped with an independent controlled 300 ℃ complete heating reaction chamber system to ensure uniform process temperature. The system has powder sample barrels, dynamic powder fluidization mechanisms, fully automatic temperature control, ALD precursor source steel cylinders, automatic temperature control valves, industrial grade safety control, as well as on-site design options such as RGA, QCM, ozone generators, glove boxes, etc. It is the best research and development tool for energy materials, catalyst materials, and new nanomaterials research and application.
4、 After sales service:
Warranty period: 1 year
Can the warranty period be extended? No
On site technical consultation: Yes
Free training: Before the equipment leaves the factory, at least 2 people will receive one week of original factory training. 2. The equipment is installed and debugged on site
Free instrument maintenance: can be arranged if needed
Warranty maintenance commitment: During the warranty period (except for natural disasters and human damage), the cost of parts, components, and travel expenses will be borne by our company
Repair commitment: In case of any malfunction during the warranty period, our company will respond promptly and send technical personnel to the site within 8 hours to solve the problem
5、 Technical parameters:
Price range: 1 million to 2 million
Origin category: Domestic Atomic Layer Deposition System (ALD)
Substrate size: 10g-1000g powder
Process temperature: RT-300 ℃
Number of precursors: 2 sets of reaction gases, 8 sets of liquid or solid reaction precursors
Weight: 300KG
Size (WxHxD): 1150 * 1030 * 1850mm
Uniformity: Achieve uniform atomic layer coating on the surface of the powder, with coating uniformity<3%
2、 Atomic layer deposition is a technique that forms a deposited film by alternately introducing gas-phase precursor pulses into a reaction chamber and chemically adsorbing and reacting on the deposited substrate. It has self limitation and self saturation. The main application of atomic layer deposition technology is to deposit high-precision, pinhole free, and highly conformal nanofilms on substrates of various sizes and shapes.
3、 Powder ALD manufacturer product description:
GM series automatic powder atomic layer deposition equipment of Xiamen Yunmao Technology Company can realize uniform and controllable atomic layer deposition or molecular layer deposition growth on micro nano powder. The reaction chamber of GM1000 can automatically run ALD (atomic layer deposition) or MLD (molecular layer deposition). The equipment is equipped with an independent controlled 300 ℃ complete heating reaction chamber system to ensure uniform process temperature. The system has powder sample barrels, dynamic powder fluidization mechanisms, fully automatic temperature control, ALD precursor source steel cylinders, automatic temperature control valves, industrial grade safety control, as well as on-site design options such as RGA, QCM, ozone generators, glove boxes, etc. It is the best research and development tool for energy materials, catalyst materials, and new nanomaterials research and application.
4、 After sales service:
Warranty period: 1 year
Can the warranty period be extended? No
On site technical consultation: Yes
Free training: Before the equipment leaves the factory, at least 2 people will receive one week of original factory training. 2. The equipment is installed and debugged on site
Free instrument maintenance: can be arranged if needed
Warranty maintenance commitment: During the warranty period (except for natural disasters and human damage), the cost of parts, components, and travel expenses will be borne by our company
Repair commitment: In case of any malfunction during the warranty period, our company will respond promptly and send technical personnel to the site within 8 hours to solve the problem
5、 Technical parameters:
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