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Xiamen Yunmao Technology Co., Ltd
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Xiamen Yunmao Technology Co., Ltd

  • E-mail

    wu.xiaoyu@ym-qbt.com

  • Phone

    19906051395

  • Address

    Anren Industrial Park, 1068-6 Jimei North Avenue, Jimei District, Xiamen City

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Dual chamber ultra-high vacuum magnetron sputtering system

NegotiableUpdate on 01/29
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Overview
The QBT-P dual chamber ultra-high vacuum magnetron sputtering system is equipped with an injection chamber and a sputtering chamber. The sputtering chamber is equipped with ion etching function, and the chamber is equipped with ultra-high vacuum transmission. The equipment vacuum degree is ≤ 3E-9Torr, and the substrate is heated at 900 ℃. It can prepare superconducting Ta/TiN/NbN/Al/Nb and other thin films
Product Details

1Dual chamber ultra-high vacuum magnetron sputtering systemCore parameters:


Instrument type: Magnetron sputtering

Origin category: Domestic

Application field: Microelectronics

Substrate size: 4 inches (customizable)

Target material: Tantalum

Substrate temperature range: RT-900 º C

Uniformity of film thickness: substrate etching uniformity<3%

Ultimate Vacuum: Ultimate Pressure<3E-9Torr


2、 Principle of Magnetron Sputtering Technology:

Form an orthogonal electromagnetic field above the surface of the cathode target. When the secondary electrons generated by sputtering are accelerated into high-energy electrons in the cathode depletion region, they do not directly fly towards the anode, but instead oscillate back and forth in an approximately cycloid motion under the action of an orthogonal electromagnetic field. High energy electrons constantly collide with gas molecules and transfer energy to them, ionizing them and turning themselves into low-energy electrons. These low-energy electrons eventually drift along the magnetic field lines to the auxiliary anode near the cathode and are absorbed, avoiding strong bombardment of the electrode plate by high-energy electrons and eliminating damage caused by heating and electron irradiation of the electrode plate during secondary sputtering, reflecting the "low-temperature" characteristics of the electrode plate in magnetron sputtering. Due to the presence of an external magnetic field, the complex motion of electrons increases the ionization rate, achieving high-speed sputtering.


IIIDual chamber ultra-high vacuum magnetron sputtering systemTechnical features:

High film-forming rate, low substrate temperature, and good adhesion of the film


4、 After sales service:

Warranty period: 1 year

Can the warranty period be extended? No

On site technical consultation: Yes

Free training: Before the equipment leaves the factory, at least 2 people will receive one week of original factory training. 2. The equipment is installed and debugged on site

Free instrument maintenance: can be arranged if needed

Warranty maintenance commitment: During the warranty period (except for natural disasters and human damage), the cost of parts, components, and travel expenses will be borne by our company

Repair commitment: In the event of a malfunction during the warranty period, our company will respond promptly and dispatch technical personnel to the site within 8 hours to resolve the issue;


5、 Technical parameters:

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6、 Craft Display:

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