PEALD

1Dual chamber high vacuum plasmaPEALDsystemCore parameters:

Price range: 1 million to 2 million

Origin category: Domestic Atomic Layer Deposition System (ALD)

Substrate size: 200mm

Process temperature: RT-500 ± 1 º C

Number of precursors: up to 3 groups of plasma reaction gases and 4 groups of liquid or solid reaction precursors can be included

Weight: 300KG

Size (WxHxD): 1400 * 1000 * 1900mm

Uniformity: Uniformity<1%

IIDual chamber high vacuum plasma ALD systemApplication principle analysis:

Atomic layer deposition is a technique that forms a deposited film by alternately introducing gas-phase precursor pulses into a reaction chamber and chemically adsorbing and reacting on the deposited substrate. It has self limitation and self saturation. The main application of atomic layer deposition technology is to deposit high-precision, pinhole free, and highly conformal nanofilms on substrates of various sizes and shapes.

Plasma Enhanced Atomic Layer Deposition (PAALD),PEALD）It is an extension of ALD technology, which generates a large number of active free radicals through the introduction of plasma, enhances the reactivity of precursor materials, expands the selection range and application requirements of ALD for precursor sources, shortens the reaction cycle time, and also reduces the requirement for sample deposition temperature. It can achieve low-temperature or even room temperature deposition, especially suitable for thin film deposition on temperature sensitive materials and flexible materials.

3、 Xiamen Yunmao Technology Co., Ltd. provides you with parameters, prices, models, principles and other information. The place of origin is Fujian, the brand is Yunmao, the model is QBT-A, and the price is 1 million to 2 million RMB. For more related information, please consult our customer service hotline 24/7.

4、 Main technical parameters:

5、 Test results display: