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Gaosmo (Chengdu) International Trade Co., Ltd
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Gaosmo (Chengdu) International Trade Co., Ltd

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    Room 4527, Block C, Oriental Hope Tianxiang Plaza, No. 500-1, Tianfu Avenue Middle Section, High tech Zone, Chengdu City, Sichuan Province

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Microscopic spectroscopic film thickness gauge

NegotiableUpdate on 05/07
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Overview

Microscopic spectroscopic film thickness gauge $r $n non-contact amp; amp; #183; Non destructive and; amp; amp; #183; Microscopic, focusing, and measurement can be completed in 1 second. The OPTM series microscopic spectrometer film thickness gauge is an alternative to ellipsometers

Product Details

Microscopic spectroscopic film thickness gauge

Microscopic spectroscopic film thickness gauge


Non contact, non-destructive, microscopic, focusing, and measurement can be completed in 1 second. The OPTM series microscopic spectrometer film thickness gauge is a new high-precision and cost-effective spectrometer film thickness gauge that can replace ellipsometers to test film thickness, refractive index n, extinction coefficient k, and absolute reflectivity. Suitable for testing various transparent film layers, and capable of removing back reflections on transparent substrates to achieve the goal of "true reflectivity and film thickness" testing. In addition, the software is easy to operate, user-friendly, and simplifies complex modeling processes.


Non contact and non-destructive, the measuring head can be freely integrated into the customer's system

Beginners can easily analyze the beginner analysis mode of modeling

High precision and high reproducibility measurement of absolute reflectance in the ultraviolet to near-infrared wavelength range, capable of analyzing multi-layer film thickness and optical constants (n: refractive index, k: extinction coefficient)

Single point focusing and measurement can be completed within 1 second

A wide range optical system (UV~NIR) under microscopic spectroscopy

● Independent testing head corresponds to various inline customization requirements

The minimum corresponding spot is about 3 μ m


Measurement project

● Absolute reflectance analysis

Multi layer film analysis (50 layers)

Optical constants (n: refractive index, k: extinction coefficient)

Transparent substrate samples such as films or glass cannot be measured correctly due to the influence of internal reflection of the substrate. The OPTM series uses an objective lens that can physically remove internal reflections, allowing for high-precision measurements even on transparent substrates. In addition, for films or SiC samples with optical anisotropy, they can also be measured separately without being affected by them.

(No. 5172203)
显微分光膜测厚仪


Scope of application

Semiconductor, composite semiconductor: silicon semiconductor, silicon carbide semiconductor, gallium arsenide semiconductor, photoresist, dielectric constant material

FPD: LCD, TFT, OLED (organic EL)

Data storage: DVD, magnetic head film, magnetic materials

Optical materials: filters, anti reflective films

Flat panel displays: LCD displays, thin-film transistors OLED

● Thin films: AR film, HC film, PET film, etc

Other: building materials, adhesives, DLC, etc


OPTM-A1

OPTM-A2

OPTM-A3


wavelength range

230 ~ 800 nm

360 ~ 1100 nm

900 ~ 1600 nm

Film thickness range

1nm ~ 35μm

7nm ~ 49μm

16nm ~ 92μm

Measurement time

Within 1 second/1 hour

Optical path size

10 μ m (minimum about 3 μ m)

Photosensitive element

CCD

InGaAs


Light source specifications

Deuterium lamp halogen lamp

halogen lamp


size

556 (W) X 566 (D) X 618 (H) mm (main body of automatic XY platform type)

weight

66kg (main body of automatic XY platform type)

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