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Suzhou Fermaco Automation Technology Co., Ltd
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Suzhou Fermaco Automation Technology Co., Ltd

  • E-mail

    leon@chinafema.cn

  • Phone

    17761910072

  • Address

    Building 3, Hongchuang Technology Park, Suzhou Industrial Park

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Metallographic polishing solution

NegotiableUpdate on 02/09
Model
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Overview
Metallographic polishing solution, due to the high polishing rate, high hardness, high durability, and large particle span of diamond, can be used for the preparation of most materials. FEMA DSPF series single crystal diamond suspension polishing solution, as well as PRW series polycrystalline diamond suspension polishing solution, select high-quality, high hardness, and sharp edged diamonds, strictly control grain size and shape, adopt advanced suspension technology, evenly grind particles, reject precipitation, and ensure efficient polishing.
Product Details

Single crystal suspension polishing solution

model

Packaging

granularity

Single crystal diamond suspension polishing solution

DSPF-1-500

500ml

9/6/3/1/0.5/0.25um


DSPF-1-500E

500ml

9/6/3/1/0.5/0.25um


DSPF-1-1000

1000ml

9/6/3/1/0.5/0.25um


DSPF-1-1000E

1000ml

9/6/3/1/0.5/0.25um

Polycrystalline suspension polishing solution

model

packaging

granularity

manyCrystal diamond suspension polishing solution

PRW-1-500

500ml

9/6/3/1/0.5/0.25um


PRW-1-500E

500ml

9/6/3/1/0.5/0.25um


PRW-1-1000

1000ml

9/6/3/1/0.5/0.25um


PRW-1-1000E

1000ml

9/6/3/1/0.5/0.25um

Aluminum oxide suspension polishing solution

model

packaging

granularity

Aluminum oxide suspension polishing solution

ASPF-0.3-500

500ml

1/0.3/0.05um


ASPF-0.3-500E

500ml

1/0.3/0.05um


ASPF-0.3-500A

500ml

1/0.3/0.05um


ASPF-0.3-1000

1000ml

1/0.3/0.05um


ASPF-0.3-1000E

1000ml

1/0.3/0.05um


ASPF-0.3-1000A

1000ml

1/0.3/0.05um


ASPF-0.3-1900

1900ml

0.3/0.05um


ASPF-0.3-1900E

1900ml

0.3/0.05um


ASPF-0.3-1900A

1900ml

0.3/0.05um

Silicon dioxide suspension polishing solution

model

packaging

granularity

Amorphous silica suspension polishing solution

SDPA-0.05-500

500ml

0.05um


SDPA-0.05-500E

500ml

0.05um


SDPA-0.05-1000

1000ml

0.05um


SDPA-0.05-1000E

1000ml

0.05um




1、 Product series and technical characteristics

1. Single crystal diamond suspension polishing solution

  • solvent typeSupport customization of water-based, oil-based, lubricating based, and alcohol based materials to meet the anti-corrosion needs of different materials1.

  • Particle size range

    • Conventional particle size: 1 μ m, 3 μ m, 6 μ m, 9 μ m (coarse to medium).

    • Precision particle size0.25 μ m, 0.5 μ m (nanometer level precision polishing, customizable).

  • Packing Specification250ml, 500ml, 1L transparent bottles for easy dosage control.

2. Diamond polishing spray

  • Morphological characteristics: spray design, the diamond powder is evenly suspended in the solvent, and the spraying coverage is more uniform.

  • Granularity coverageW0.1 to W40 (ultra fine W0.1 to coarse grinding W40 for culvert cover).

  • Packaging capacity260g/bottle, 350ml/bottle, suitable for manual or semi-automatic equipment.

3. Polishing paste and micro powder(Supporting products)

  • polishing pasteThe paste like carrier contains self-lubricating components and is suitable for manual precision polishing of soft materials such as aluminum and copper alloys.

  • micronized powderProvide users with the ability to independently allocate carriers, with high flexibility.

2、 Core performance advantages

  1. Efficient Grinding and Energy Saving

    • Polishing efficiency improvementCompared to traditional alumina polishing solution, the usage is reduced by 30% and the time is shortened by 60%.

    • Suspension stabilityUsing physical chemical double action suspension technology, particles are uniformly dispersed and stored for a long time without precipitation.

  2. Surface quality optimization

    • Low damage polishingSingle crystal diamond has sharp cutting edges, reduces subsurface damage, and truly restores the microstructure of materials (such as hard alloy grain boundaries and semiconductor wafer defects).

    • Wide adaptabilityCompatible with various types of polishing cloths (non-woven FP-PLAN, plush FP-FLOC) and automatic/manual equipment.

  3. Environmental protection and operational convenience

    • Water based formula is non-toxic and environmentally friendly, while oil-based is suitable for waterproof materials such as PCB.

    • The spraying agent supports the "centrifugal radius spraying method", which completes spraying in 3-5 seconds, simplifying the process.

3、 Application scenarios and selection suggestions

Material Type Recommended Products Granularity selection advantage
Hard alloy/ceramic Single crystal suspension (water-based) 6 μ m (coarse polishing)+1 μ m (fine polishing) High cutting force, anti collapse edge
Semiconductor/Silicon Wafer Single crystal suspension (oil-based) 0.25μm Nano level precision
Soft metal (Al/Cu) Diamond polishing paste W3.5–W5 Self lubricating and scratch resistant
composite material spray W10–W20 Quickly cover heterogeneous interfaces

noteFor precision polishing, it is recommended to use FEMA polishing lubricant (such as Lubricant Green series) to enhance cooling and anti adhesion effects.

4、 Usage guide and precautions

  1. preprocessingThe polishing cloth should be soaked in clean water to avoid dry friction and temperature rise, which may cause oxidation of the sample.

  2. Spray coating specifications

    • After the spray agent is shaken evenly, it is sprayed along the radius 20cm away from the polishing disc, and the new cloth is extended to 8 seconds to enhance adsorption.

    • It is recommended to add the suspension dropwise and cooperate with the automatic distribution system of the equipment (such as Fpol 252C Pro grinding and polishing machine).

  3. Cooling assistanceContinuously drip water or specialized coolant during polishing to suppress thermal effects.

summary

The diamond polishing liquid system of Fermat instrumentMulti form adaptation(suspension/spray/paste)Nano level precision coverageandScenario based formulaAs a core competitive advantage, especially in the fields of high hardness material polishing and microelectronic sample preparation, it has significant advantages. Its technological highlights lie in:

  • Customization flexibilitySupport on-demand customization of particle size and solvents;

  • Process efficiency improvementShorten the sample preparation cycle through suspension stability and high grinding rate;

  • Ecological compatibilityEnvironmentally friendly formula reduces the risk of laboratory contamination.
    This product line can meet the full scenario requirements from industrial testing (metallographic analysis of automotive parts) to cutting-edge scientific research (semiconductor failure analysis).