LAUDA Noah POU Thermoelectric Process Thermostat: Temperature Control from -20 to 90C

LAUDA Noah POU thermoelectric process thermostat is used in the semiconductor industry, providing temperature control from -20 to 90C

Meet the requirements of demanding process speed and temperature control

The thermoelectric online use (POU) temperature control system provides stable temperature control for plasma etching processes. The system dynamically controls the temperature of the electrostatic chuck (ESC) and can be used in any etching process. The basis for the design of LAUDA Noah POU thermoelectric temperature control system is based on the temperature change principle of Peltier elements. These components can achieve fast and accurate temperature control, meeting the requirements of devices with increasingly smaller production sizes today.

Important functions

Low energy consumption system without compressor and refrigerant

The industrial sector occupies a small area, and if placed under the floor, there is no requirement for occupying space

Extremely low filling amount of thermal conductive liquid

Standard accessories

Liquid filling tank with manual pump

Optional accessories

Communication module that can be remotely controlled (RS-485 communication protocol)

LAUDA Noah POU online use (POU) temperature control system can save up to 90% of energy compared to compressor systems. The option to install under the floor allows the system to take up very little space, saving clean room space.