JK-VYP50High temperature small vacuum hot press machine

Keywords: vacuum hot pressing,50mmx50mm，Thin film transfer

JK-VYP50 High Temperature Small Vacuum Hot Press MachineIt is a miniaturized flat plate vacuum hot press machine designed for wafer welding or film transfer, capable of processing a maximum sample size of 50mmx50mmx15mm. The performance of the equipment is very suitable for the sintering and bonding research of third-generation semiconductor devices. The maximum operating temperature of the instrument is 500 ℃ and the maximum pressure is 5000N. The vacuum and atmosphere environment that can be provided during the semiconductor device preparation process can minimize material oxidation, making it a cost-effective laboratory research and development equipment.

（1） Technical parameters:

1Maximum pressure:500Kg（5000N）（500At a temperature of ℃）

2. Vacuum degree<5 * 10E-2 torr (cold state, vacuum pump for 30 minutes)

3. Pressure display range: 1-500 Kg

4. Constant pressure time setting range: 1-9999min (adjustable)

5The press has two working modes: manual and automatic

6. Both the upper and lower heating platforms are installed inside the vacuum chamber;

7. The flatness of the upper and lower heating platforms in the cold state is ≤ 0.005mm

8、two pieces50mm x50mm heating platform, made of heat-resistant stainless steel, can withstand a maximum temperature of 500 ℃ (<30min);

9. The maximum size of the sample that can be placed is 50 * 50 * 15mm;

10、adjustable30 stage temperature rise and fall program, with a temperature control accuracy of+/1 ℃

11、Continuous operating temperature:450℃

12The fastest heating rate:10℃/min

13Total power:500W

14、 Power Supply:208-240VAC, 50/60 Hz single-phase

15Cooling method:water cooling

16、host200mm(L) x 130mm(W) x 700mm(H)

17Control box:340*300*140mm