Integrated Circuit Ultra Pure Water Equipment

In large-scale integrated circuit ultra pure water quality, the water quality indicators that receive priority attention are: electrical resistivity TOC、 Silicon, particles, heavy metals, dissolved oxygen, alkali metals, and other substances dissolve in water. However, in the manufacturing process of integrated circuit chips, the more ion components in the water used, the greater the impact on the manufacturing process of the product, resulting in a decrease in product yield.

Ultra pure water equipment for integrated circuits is commonly used for cleaning industrial semiconductor raw materials and utensils, making photolithography masks, and as a water vapor source for silicon wafer oxidation. In addition, the production of vacuum tubes, thick and thin film circuits, solid-state electronic devices, printed circuits, etc. also require the use of ultrapure water. With the continuous development of technology, the integration degree of integrated circuits is increasing day by day, and the requirements for water quality are also increasing, which puts forward stricter requirements for the sustainability of ultra pure water treatment processes and products, the continuity of production, the automation and simplicity of equipment.

technological process:

Raw water → raw water booster pump → multi-media filter → activated carbon filter → water softener → precision filter → cation resin filter bed → anion resin filter bed → anion resin mixed bed → microporous filter → water point
Raw water → Raw water booster pump → Multi medium filter → Activated carbon filter → Softener → Precision filter → First stage reverse osmosis → PH adjustment → Intermediate water tank → Second stage reverse osmosis (with positive charge on the surface of the reverse osmosis membrane) → Purified water tank → Pure water pump → Microporous filter → Water point
Raw water → Raw water booster pump → Multi medium filter → Activated carbon filter → Softener → Precision filter → Primary reverse osmosis machine → Intermediate water tank → Intermediate water pump → EDI system → Microporous filter → Water point

The infiltration source pure water needle adopts advanced fully automatic two-stage reverse osmosis+EDI electric desalination+polishing mixed bed treatment technology for ultra pure water equipment used in integrated circuits. In the pre-treatment part, reverse osmosis treatment is used to effectively remove various salts and impurities in the water. Then, EDI electric desalination and polishing mixed bed technology is used to effectively remove soluble ions from the water quality, further improving the effluent water quality and making the final effluent water quality meet the requirements of the water use process.

Equipment characteristics:

1. Adopting imported booster pump, with high noise and low efficiency, stable and reliable
2. Fully automatic electronic control program, with optional touch screen operation for easy use.
3. Adopting a fully automated preprocessing system to achieve unmanned operation and reduce manual maintenance costs.
4. Adopting imported reverse osmosis membrane, with high desalination rate, long service life, and low operating cost.
5. Personalized design tailored to local water quality, fully meeting needs in all aspects.
6. Online water quality monitoring and control, real-time monitoring of water quality changes, ensuring water quality safety.
7. It saves recycled water and wastewater treatment facilities, with a high water production rate (up to 95%).
8. No need for acid-base storage and acid-base dilution transportation facilities, safe and reliable use, avoiding workers' contact with acid-base.
9. Simplify the installation process and reduce the site footprint.

Application fields:

1. Ultra pure water is used for semiconductor materials, devices, printed circuit boards, integrated circuit products, and semi-finished products.
2. Transistors are mainly used for cleaning silicon wafers in production, with a small amount used for drug preparation.
3. Production, processing, and cleaning of semiconductor materials and crystalline materials.
4. High purity water cleaning of silicon wafers in integrated circuit production.
5. Production of electronic tubes and preparation of carbonate solution for cathode coating of electronic tubes.
6. Optoelectronic products, other high-tech precision products.
7. Pure water is used for the production and batching of cathode ray tubes and cathode ray tubes.
8. Cleaning of aluminum foil and workpieces for electrolytic capacitor production.