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Shanghai Ruidan Automation Instrument Co., Ltd
Hall ion source
NegotiableUpdate on 05/19
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Overview
The Hall ion source eH2000eH3000 was founded by Dr. Kaufman in the United States in 1978; amp; Robinson, Inc. develops and produces Kaufman ion sources and Hall ion sources The Kaufman ion source in the United States has gained great recognition from customers after more than 40 years of precipitation and development. Ionic sources are widely used in the fields of ion cleaning, ion etching, auxiliary coating, and ion sputtering deposition
Product Details
Hall ion sourceEH2000eH3000 In 1978, Dr. Kaufman founded Kaufman&Robinson, Inc. in the United States to develop and produce Kaufman ion sourcesHall ion sourceThe Kaufman ion source in the United States has gained great recognition from customers after more than 40 years of precipitation and development. Ionic sources are widely used in the fields of ion cleaning, ion etching, auxiliary coating, and ion sputtering deposition
Hall ion sourceEH2000eH3000 Technical Parameters：
BloodHall ion sourceGridless eHseries
eHseriesHall ion sourcecompact structure,High beam current, low energy, and large irradiation area,Can effectively process thin films and surfaces with nanometer precision,Provide for the manufacturing processVarious functions such as auxiliary coating and pre cleaning are available, with a wide range of models to meet various applications in scientific research, industry, and more
The following characteristics:
No grid mesh
High current, low energy
Divergent beam>45degree
Can quickly replace anode module
Multiple neutralizers to choose from
United StatesBloodkaufman ion sourceGridded KDCseries
United StatesBloodKaufman ion source from Kaufman CorporationKDCThe series includes multiple ion sources of different sizes to meet various applications. kaufman ion sourceKDCProvide a complete solution，Including Kaufman ion source,Electronic neutralizer,Power supplies and other components can be directly integrated into various vacuum equipment,For example, small-scale laboratory research and development,coating machine, load lock,Sputtering system,Winding coating machine and linear coating.
BloodRF ion sourceGridded RFICPseries
RF ion sourceRFICPSeries, generating plasma through RF coils,Controlling the energy and direction of the ion beam through a grid,It is a powerful tool for manufacturing precision films and surface treatments,Effectively improve film density, light transmission, uniformity, adhesion, etc，Provide stable support for the process.
RFICPThe series provides a complete product portfolio,Contains ion source,Electronic supplier,neutralizer,Power control, etc
