Filmetrics automatic measurement optical film thickness gauge

NegotiableUpdate on 01/05

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Nature of the Manufacturer: Producers

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Place of Origin

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Overview

The Filmetrics automatic optical film thickness gauge, with the help of the F54-XYT-300 spectral reflection system, can quickly and easily measure the film thickness of 200 x 200mm samples. The electric XY worktable automatically moves to the selected measurement point and provides fast thickness measurement at a speed of two points per second.

Product Details

Filmetrics automatic measurement optical film thickness gaugeIntroduction:

The Filmetrics F54-XYT-300 automatic measurement optical film thickness gauge, with the help of the F54-XYT-300 spectral reflection system, can quickly and easily measure the film thickness of 200 x 200mm samples. The electric XY worktable automatically moves to the selected measurement point and provides fast thickness measurement at a speed of two points per second.

Characteristic advantages:

Automated film thickness drawing system, fast positioning and real-time result acquisition;
Measurable sample film layer: basically smooth. Non metallic thin films can be measured;
The surveying results can be presented in 2D or 3D, making it convenient for users to view them from different angles;

Measurement principle:

When incident light passes through interfaces of different substances, some of the light will be reflected. Due to the fluctuation of light, the reflected light from multiple interfaces interferes with each other, resulting in oscillations in the multi wavelength spectra of the reflected light. From the oscillation frequency of the spectrum, the distance between different interfaces can be determined to obtain the thickness of the material (more oscillations represent greater thickness), as well as other material properties such as refractive index and roughness.

Application and film examples:

Semiconductor film layer	display technology	consumer electronics	Parylene
photoresist	OLED	waterproof coating	Electronic products/circuit boards
dielectric layer	ITO and TCOs	RFID (Radio Frequency Identification)	magnetic materials
gallium arsenide	Air box thickness	solar cell	Medical equipment
Micro-electromechanical Systems	PVD and CVD	Aluminum shell anode film	silicone rubber

Common industrial applications:

semiconductor manufacturing	LCD display	Optical coating	MEMS Micro Electro Mechanical Systems
photoresist	polyimide	Hard coating	photoresist
Oxide/Nitride/SOI	ITO transparent conductive film	Anti reflective coating	Silicon based film layer
Grinding of wafer backside

Product Parameters:

Wavelength range:	190nm-1700nm	light source	Tungsten halogen lamp, deuterium lamp
Measurement of NK thickness requirement 1 *:	50nm	Measurement accuracy 2:	0.02nm
Accuracy *: Take the larger one	1nm or 0.2%	Stability 3:	0.05nm
Sample size:	≤ 300mm diameter	Speed (including vacuum platform):	5 points -8 seconds 25 points -21 seconds 56 points -43 seconds

spot size	Standard 500 micron aperture	Optional 250 micron aperture	Optional 100 micron aperture
5X objective lens	100μm	50μm	20μm
10X objective lens	50μm	25μm	10μm
15X objective lens	33μm	17μm	7μm
50X objective lens	10μm	5μm	2μm