Film thickness gauge

Film thickness gauge

Film thickness gauge

Product information: Measurement range from thin film to thick film, UV~NIR spectral analysis. A high-performance, low-cost optical thin film measuring instrument that uses absolute reflectance spectroscopy to analyze film thickness. It inherits 90% of the FE-3000 model's functions without complex settings and is easy to operate,

Special length

● Supports various film thicknesses from thin film to thick film

● Use reflectance spectroscopy to analyze film thickness

● Achieve non-contact, non-destructive high-precision measurement, while being small in size and low in price

● Simple condition setting and measurement operation! Anyone can easily measure the thickness of the film

Various film thickness measurements can be performed using peak valley method, frequency analysis method, nonlinear least squares method, optimization method, etc.

The nonlinear least squares thin film thickness analysis algorithm can perform optical constant analysis (n: refractive index, k: extinction count).

measurement project

Absolute reflectance measurement

Film thickness analysis (10 layers)

Optical constant analysis (n: refractive index, k: extinction count)

measurement object

Functional film, plastic
Transparent conductive film (ITO, silver nanowires), phase difference film, polarizing film, AR film PET、PEN、TAC、PP、PC、PE、PVA、 Adhesive, bonding agent, protective film, hard coating, anti fingerprint, and so on.

semiconductor
Compound semiconductors Si、 Oxide film, nitride film Resist、SiC、GaAs、GaN、InP、InGaAs、SOI、 Sapphire, etc.

surface treatment
DLC coating, rust inhibitor, anti fog agent, etc.

optical material
Filter, anti reflective film, etc.

FPD
LCD (CF, ITO, LC, PI), OLED (organic film, packaging material), etc

other
HDD、 Magnetic tapes, building materials, etc

Measuring principle

Otsuka Electronics utilizes optical interferometers and its own high-precision spectrophotometers to achieve non-contact, non-destructive, high-speed, and high-precision measurement of thin film thickness. Optical interferometry is a method of determining optical film thickness using reflectance obtained from an optical system of a spectrophotometer, as shown in Figure 2. Taking the thin film coated on a metal substrate as an example, as shown in Figure 1, the light incident from above the target sample is reflected by the surface (R1) of the thin film. In addition, light passing through the film is reflected at the interface between the substrate (metal) and the film (R2). The method of measuring the optical interference phenomenon caused by phase shift due to optical path difference and calculating the film thickness based on the obtained reflection spectrum and refractive index is called optical interferometry. There are four analysis methods: peak valley method, frequency analysis method, nonlinear least squares method, and optimization method.

specification