Direct writing lithography machine

NegotiableUpdate on 02/09

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

The CG-MLC6 series direct writing lithography machine is a sophisticated lithography product. This device adopts digital lithography technology, which does not require a mask and can directly transfer layout information to a substrate coated with photoresist. The CG-MLC6 series has flexible functions, small size, and high cost-effectiveness, tailor-made for universities, laboratories, and research institutions. Its main application products include various MEMS fabrication (such as MEMS microphones, pressure sensors, accelerometers, gyroscopes, ultrasonic sensors, piezoelectric sensors), mask fabrication, etc.

Product Details

Direct writing lithography machineProduct Features:

Digital lithography system

Maskless direct writing lithography for micro nano devices

Photomask template production

3D structure exposure function

Automatic alignment function

User defined marker alignment function

Visual fixed-point exposure function

Auto focus function

Irregular sample exposure

Quick and Fine Exposure Modes

Supports multiple data formats (GDS II/Gerber/O DB++)

Back alignment function (optional)

405nm LD light source (375nm optional)

Direct writing lithography machineparameter

model	MLC Lite
model	Mode	Mode Ⅱ	Mode Ⅲ
Minimum feature size	0.5μm	1μm	2μm
Minimum line width and spacing	0.8μm	1.2μm	2.5μm
CD uniformity	10%	10%	10%
Two layer alignment accuracy 5x5m ㎡	500nm	800nm	1000nm
Two layer alignment accuracy 50x50m ㎡	800nm	1000nm	1500nm
production capacity	50mm²/min	100mm²/min	300mm²/min
Minimum substrate size	5mm x 5mm
Substrate thickness	0.1-12mm (optional)
Exposure area	150mm x 150mm
Grayscale exposure	Optional 128 levels
Exposure light source	Laser, 405nm or 375nm