Product Introduction
The low-temperature catalytic gas purification system uses proprietary patented catalysts and adsorbents, which have the advantages of long service life, high purification depth, and strong instantaneous fluctuation ability of antigen feed gas. By combining physical adsorption and catalytic reaction, it can purify H2O, O2, CO, CO2, H2, and MCHC in inert gases and N2 to a level of less than 1 ppb at room temperature, and also remove O2, CO2, and H2O in H2. This system has three operation types: manual, semi-automatic, and fully automatic, which can be selected according to usage requirements.
Product Performance
Suitable for use with raw gas with a purity of not less than 99.999%
This product has a dual structure, with one set for operation and the other set for regeneration and backup
◎ High purification depth, with various impurity content<10ppb for export ◎ Electrochemical polishing of 316 (L) stainless steel
◎ Built in high-efficiency particle filter
◎ Adopting a combination of catalytic and adsorption processes
Low working temperature, more energy-efficient equipment
Product Application
◎ Protection gas purification: Steel, petrochemical, and machinery industries
High purity monocrystalline silicon, wafer epitaxy, large-scale integrated circuits, optoelectronic product production and other electronic industry gas terminal purification
◎ Semiconductor process equipment: CVD, MOCVD, HVPE, diffusion furnace, etc
◎ Bulk gas purification
system parameter