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Huayixing (Beijing) Technology Co., Ltd
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Huayixing (Beijing) Technology Co., Ltd

  • E-mail

    cif_lab@163.com

  • Phone

    18511111800

  • Address

    Room 301, International Enterprise Incubation Center, No. 7 Kexing Road, Fengtai District, Beijing

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CIF laboratory type plasma cleaning machine

NegotiableUpdate on 01/04
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Overview

CIF has launched a new generation of CPC-G series laboratory plasma cleaning equipment, changing the design concept of traditional plasma cleaning equipment. The CIF laboratory type plasma cleaning machine has a large cavity size and effective sample processing area, low operating cost, high cost-effectiveness, fast and efficient processing, and is particularly suitable for small-scale pilot production in universities, research institutes, and optoelectronic enterprise laboratories.

Product Details

Product Features:

◆7-inch color touch screen with interactive operation interface in both Chinese and English, automatic control and monitoring of process parameter status, 20 formula programs, and traceable process data storage.

◆The PLC industrial computer controls the entire cleaning process, with two working modes: manual and automatic.

◆Quartz vacuum chamber, vacuum pipeline system adopts316 stainless steel material, corrosion-resistant and pollution-free.

◆By using a mass flow meter, precise control of gas input can be achieved, changing the problem of inaccurate gas flow control in traditional float flow meters.

◆HEPA high-efficiency filtration, gas backfilling and purging to prevent secondary pollution.

◆The 60 degree tilt angle operation interface design conforms to ergonomics, is easy to operate, and has a friendly interface.

◆Top mounted vacuum chamber, top opening cover design, downward pressure hinge switch method, convenient opening and closing cover.

◆CIF laboratory type plasma cleaning machineAdopting a showerhead style porous air intake method to address the issue of uneven single hole air intake in traditional plasma cleaning machines.

◆Upward styleThe design of a 360 degree free horizontal sample tray conforms to ergonomics and is more convenient to operate.

◆Large effective cleaning area, capable of cleaning the maximum diameter8-inch silicon wafer.

◆Security protection, the cabin door opens and the power is automatically turned off.