Atomic layer deposition system

SAL1000GAtomic layer deposition systemFeatures:

-Diversity-

·The vacuum movable glove box can handle samples that are prone to oxidation.

·The precursor comes standard with two sets of valves and gas cylinders.

·You can choose to heat the precursor to 200 degrees Celsius.

·The automatic rotation bracket for the substrate can be selected.

·Powder deposition accessories can be selected.

·You can choose cost-effective exhaust gas treatment equipment.

-Performance-

·Ensure the deposition of each uniform atomic layer pinhole free layer on the substrate surface.

·Depositing on uneven or 3D shaped surfaces through stepped coverage.

·Compared with CVD and PVD, better deposition can be achieved, especially for materials with higher aspect ratios and porous deposition.

-User friendly interface-

·The touch screen allows users to easily set formulas or deposition processes, and check the movement of each drive system.

·It can perform automatic sedimentation and automatically discharge N2 after sedimentation is completed.

·The vacuum exhaust and introduction of inert gas in the glove box can also be automatically completed.

-Security-

·This is an advanced device with various interlocking functions.

-The top hatch with gentle closing function allows users to easily load and unload substrates.

SAL1000GAtomic layer deposition systemTechnical parameters: