1000 degree high temperature hot table infrared emissivity test silicon wafer annealing furnace

The 1000 degree high-temperature hot table infrared emissivity test silicon wafer annealing furnace is mainly used to observe and analyze changes in the microstructure of materials at high temperatures. This type of device is capable of heating samples to up to 1000 degrees Celsius in a controlled vacuum or atmosphere environment, while using a microscope for real-time or post experimental microstructure observation and analysis. This vacuum hot stage has a wide range of applications in the fields of materials science and engineering