New product releases for vapor deposition, sputtering, and probe stations

Recently, our company has upgraded to a small sputtering systemEvaporation instrument: 1. The chamber material is made of all aluminum alloy and processed into a single piece. 2. The air inlet is directly machined on the side wall of the cavity to reduce the number of pipe connections by at least 3, thereby reducing the risk of air leakage failure. 3. The equipment width has been reduced from 435mm to 420mm. 4. The sputtering magnetic field has been strengthened. 5. Both products have reserved SMA expansion ports for crystal oscillator or other signal input and output. A small desktop sputtering power controllable magnetron sputtering instrument, with complete functions, equipped with voltage and current feedback, sample stage rotation, sample height adjustment, and electric baffle function. By adjusting the pre sputtering power and thin film deposition power at regular intervals, most metals can be uniformly physically deposited. The vacuum chamber is made of transparent quartz glass to reduce sample contamination, and the sample stage can be rotated to obtain more uniform thin films. Various metal thin films can be prepared.

2025 1-inch miniature probe station: Modified 3-axis slide table to enhance rigidity and strength, increase stroke, improve accuracy and service life, increase the inner diameter and height of the cavity, upgrade the electrical interface to enhance insulation resistance and maximum applied voltage limit.