With the deep penetration of micro nano technology in fields such as photon integration, biomedicine, and MEMS manufacturing, different industries have put forward differentiated demands for the accuracy, material compatibility, and processing efficiency of three-dimensional micro nano structures. Nano Nuo 3D Nanoscribe relies on the expertise of 2GL ® Two photon grayscale lithography technology is used to create a three-dimensional micro nano processing solution that covers the entire process of "scientific research innovation industrial mass production". With the core advantages of "high precision+high flexibility+multi scene adaptation", it has become a key choice for various industries to break through the bottleneck of micro nano processing.

In the field of photon packaging, micro nano 3D printing technology, especially two-photon polymerization (2PP) technology, provides a revolutionary solution for efficient and low loss optical coupling between optical fibers and chips due to its high precision, true 3D processing capability, and no need for masks.

Overall, Nano Nano 3D Nanoscribe is a recognized industry benchmark in this field. Its core technology is two-photon grayscale lithography (2GL) ®）， Combining the accuracy of two-photon aggregation with the efficiency of grayscale lithography is highly suitable for the manufacturing of complex three-dimensional micro nano structures in photon packaging.

1、 Technical route selection

1. Two Photon Aggregation 2PP (Femtosecond Laser Direct Writing): Targeting sub micron to micron level free-form three-dimensional structures, it has extremely high design freedom and is suitable for complex micro optics, micro mechanics, microfluidics, and biological scaffolds; Can be directly formed on complex substrates, supporting multiple materials and composite processes.

2. Two photon grayscale lithography 2GL: Balancing 2.5D/3D in the same workflow, achieving surface super smoothness and integrated control of refractive index/morphology through fine modulation of voxel intensity, suitable for high numerical aperture micro optics, gradient refractive index devices, and high-precision mold master.

3. Femtosecond laser "two in one" composite strategy: asymmetric two-photon polymerization (construction of anisotropic hydrogel joints) and in-situ laser reduction deposition of silver nanoparticles (giving photothermal driving and sensing functions) are combined on the same platform for active microsystems such as multi joint micro robots and reconfigurable deformation devices.

4. Direct printing on fiber/chip: Provides tilt correction and multi degree of freedom alignment, enabling fiber end face SERS probes, waveguide micro optics hybrid integration, and additive manufacturing of 3D microstructures within the chip, significantly reducing packaging and alignment costs.

5. Wafer level Batch and Automation: Targeting batch processing of 6-inch wafers, it supports automatic resin distribution, multi-user processes, and remote monitoring, catering to both rapid prototyping and small-scale production needs.