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Hangzhou Fansuoneng Ultrasonic Technology Co., Ltd
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instrumentb2b>About Us

Hangzhou Fansuoneng Ultrasonic Technology Co., Ltd

  • E-mail

    hzfsn@foxmail.com

  • Phone

    13738015913

  • Address

    4th Floor, Building 2, Science and Technology Innovation Industrial Park, No. 16 Changtai Street, Changkou Town, Fuyang District, Hangzhou City, Zhejiang Province

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Company Profile
Company Name:
Hangzhou Fansuoneng Ultrasonic Technology Co., Ltd
Year Established:
2026/2/17 9:27:53
Registered Capital:
Main Products:
Address:
4th Floor, Building 2, Science and Technology Innovation Industrial Park, No. 16 Changtai Street, Changkou Town, Fuyang District, Hangzhou City, Zhejiang Province

Hangzhou Fansuoneng Ultrasonic Technology Co., Ltd. was founded in 2018 by several experts with over 10 years of practical experience in the field of high-power ultrasound. It has established deep cooperation, research and development, and production with more than 500 domestic and foreign research institutes, universities, and enterprises in various industries, and its products have strong core competitiveness.

We have been committed to the application of ultrasonic precision spraying and complete equipment solutions, integrating research and development, production, sales, and after-sales service. We have always used our rich industry experience and tailored solutions to help customers solve any problem, providing comprehensive solutions and high-quality products to all users. The main products and services include ultrasonic atomization spraying equipment, ultrasonic liquid treatment equipment, ultrasonic indium coating equipment, ultrasonic metal melt treatment, ultrasonic welding equipment, ultrasonic cutting equipment, and ultrasonic core accessories.

We always keep in mind our mission, prioritize quality, and have the courage to innovate. Our products have won multiple national special projects. We are deeply involved in the ultrasound application industry, promoting the rapid development of ultrasound applications in China and actively filling the gap in ultrasound applications.






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