In the semiconductor manufacturing process, etching is a key process step, and its accuracy directly determines the performance of the chip. Traditional measurement methods often fall short when facing complex etching profiles, but the emergence of the Sensofar S neox 3D optical profiler has brought a breakthrough solution to this problem.

The etching process selectively removes chip materials through wet etching or dry etching to shape circuit features. During this process, the uniformity of etching depth and the accuracy of sidewall angles become key parameters affecting device performance. Especially with the continuous reduction of device size, the demand for measurement accuracy is also increasing.

The Sensofar S neox 3D optical profilometer adopts a 50x interferometric lens measurement technology, which can accurately capture the three-dimensional contour information of the etching profile. This non-contact, high-resolution measurement method provides manufacturers with an effective means of process monitoring.

Through the SensoPRO software developed by Xianjin, the system can achieve highly automated analysis at the nanoscale, greatly improving measurement efficiency and accuracy. This technological breakthrough enables etching features to strictly meet dimensional tolerance requirements, providing reliable data support for process optimization.

The S Neox optical profilometer integrates four technologies: confocal, interferometric, Ai multifocal overlay, and film thickness measurement, forming a complete measurement solution. This multi technology fusion design concept enables it to cope with various complex measurement scenarios.

Confocal technologyProvide the highest qualityThe horizontal resolution reaches 0.14 μ m, meeting the stringent requirements for measuring critical dimensions.Interference techniqueIt can achieve height measurement with sub angstrom resolution, especially suitable for characterizing smooth and continuous surfaces.

Sensofar has been deeply optimized in terms of user experience. SensoSCAN software provides a clear and intuitive operating interface, allowing users to complete automatic measurements with just one click. The system can intelligently recognize the lighting conditions and measurement range, and obtain high-quality results within seconds.

The support of the automatic measurement module enables users to easily implement custom programming to achieve quality management and testing objectives. Through the automatic recognition of alignment points in images, fully automated measurement without human intervention has been achieved, significantly improving detection efficiency.

This technology has demonstrated strong advantages in multiple fields:

micro-electronics fabricationIn addition, it can quickly and non destructively measure the initial deflection of nano pressure sensors;

precision machiningIn the field, it can accurately measure the cutting edge parameters of complex cutting tools;

medical equipmentIndustry provides support for surface morphology analysis of dental implants.

Sensofar always adheres to the highest quality standards, and all equipment complies with the ISO25178 standard. The system uses traceable standard blocks for calibration to ensure the accuracy and reliability of measurement data. This rigorous quality control system provides reliable measurement assurance for scientific research and industrial production.

With the continuous development of semiconductor technology, the demand for measurement accuracy will continue to increase. The Sensofar S neox 3D optical profiler has set a new industry standard for etching profile measurement through technological innovation, helping the manufacturing industry move towards greater precision and intelligence.

This instrument not only represents the highest level of current optical measurement technology, but also lays a solid foundation for the future development of micro nano manufacturing. Its outstanding performance and reliable performance make it an ideal choice for quality control in scientific research institutions and enterprises.