VPG 300 DI Maskless Projection Lithography System

NegotiableUpdate on 05/07

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

The VPG 300 DI maskless projection lithography system is a high-performance direct writing lithography system designed to shorten the innovation cycle from weeks to hours. The VPG 300 DI combines the precision of traditional i-line stepper and the advantages of maskless workflow, enabling researchers and engineers to directly draw high-resolution microstructure patterns on chips up to 300 millimeters in size with excellent speed and flexibility.

Product Details

VPG 300 DI Maskless Projection Lithography SystemIt is a high-performance direct writing lithography system designed to shorten the innovation cycle from weeks to hours. The VPG 300 DI combines the precision of traditional i-line stepper and the advantages of maskless workflow, enabling researchers and engineers to directly draw high-resolution microstructure patterns on chips up to 300 millimeters in size with excellent speed and flexibility.

VPG 300 DI Maskless Projection Lithography Systemcharacteristic

Exposure speed

Can write an area of 100 x 100 square millimeters within 9 minutes

Exposure quality

Edge roughness<40 nm, CD uniformity<50 nm, resolution<500 nm

Calibration accuracy

Second layer alignment (top) as low as 100 nm, back VIS/IR ± 1 µ m

Automatic alignment

Automatic global and local alignment, and distortion correction; Align the back of VIS; Infrared alignment of embedded structures

Auto focus

Optical or pneumatic autofocus with dynamic compensation>160 µ m

Including metering function

Position, CD, and edge roughness

Stability of Writing

Integrate environmental measurement, flow box, and software correction functions to compensate for environmental changes