Silicon dioxide polishing solution
Silicon dioxide polishing solution:
Our company has developed a polishing solution for rough polishing of silicon wafers based on self-developed high-purity silica abrasives. This polishing solution has a high dilution ratio and is easy to clean on the surface after polishing. The product is widely used in various industries.
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Testing items
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test method
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Indicator value
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appearance
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visualization
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Milky white liquid
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Solid content (%)
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gravimetric method
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40±2
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PH value (20 ℃)
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pH meter
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11.5-12.5
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Particle size (nm)
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Laser Particle Size Analyzer
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80±10
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Large particle count (parts/ml)
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Large particle counter
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﹤1000000
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Our company develops polishing solutions for various materials through professional laboratories, and can configure polishing solutions according to different materials. Welcome to inquire by phone: