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E-mail
wulihua@cinv.cn
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Phone
18019703828
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Address
Room 301, Building A, No. 2250 Pudong South Road, Pudong New Area, Shanghai
Shanghai Xinu Optical Technology Co., Ltd
wulihua@cinv.cn
18019703828
Room 301, Building A, No. 2250 Pudong South Road, Pudong New Area, Shanghai
Semiconductor industry testing solutions
Fully automatic Framed Wafer AOI equipment
ProEye 01

Providing specialized inspection and measurement solutions for cutting related processes to ensure the reliability of the final product is a crucial task. High speed detection of defects such as cutting lines, cracks, scratches, impurity particles, and missing Die requires the comprehensive use of multiple technical means and strategies to ensure product quality and production efficiency.

Fully automatic wafer infrared AOI equipment
ProEye 02

Devices using autonomous infrared optical systems rely on theirThe functionality and design meet the precise requirements for infrared and visible light in various detection applications. This system not only integrates professional and rich optical components, but also hasThe imaging quality ensures the accuracy and reliability of the detection results.

Fully automatic wafer AOI equipment
ProEye 03

This device is independently developed and hasThe wafer inspection system with independent intellectual property rights is designed specifically for scenarios that require automation, high efficiency, and high precision in wafer and chip production processes. We have conducted in-depth analysis of the characteristics of various samples and finely optimized the accuracy, stability, and ease of operation of defect detection, striving to meet diverse detection needs. The device provides both automatic and manual operation modes, which can serve as an efficient and stable production equipment, as well as a flexible and convenient research and development tool, providing users withTesting solutions.

Semi automatic wafer optical acquisition equipment
Spectator on

SpectView SA is a microscopic automation solution independently developed by Xili Technology, which integrates a high-precision motion platform, laser active focusing module, optical microscopy control, and advanced image processing algorithms. It is specifically designed for automatic image acquisition of wafers in semiconductor manufacturing processes for comprehensive and accurate detection and analysis.



Semiconductor industry testing solutionsTechnical Specifications
Wafer Type |
Raw Wafer Framed Wafer |
|
Wafer Size |
6' (150mm) 8' (200mm) |
|
Illumination method |
Bright/Dark/Mixed |
|
Objective Magni magnification |
2X 5x 7.5X |
10X |
Image Resolution (µ m/pixel) |
1.600 0.640 0.427 |
0.320 |
Camera Field of View (mm) |
11.20 x 11.20 4.48 x 4.48 2.98 x 2.98 |
2.24 x 2.24 |
Maximum Capacity (WPH @ 8 ') Max Throughput |
90 15 7 |
4 |
Inspection Accuracy |
Up to 0.5µm (CD) / 1.0um (defect), @ 10X |
|
Damage rate |
< 10 PPM |