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E-mail
sales@xianweijing.com
- Phone
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Address
5th Floor, 2440 Pudong Avenue, Shanghai
Shanghai microscope
sales@xianweijing.com
5th Floor, 2440 Pudong Avenue, Shanghai
1、 Purpose:
The CMM-DA series large platform metallographic microscope is suitable for microscopic observation of opaque objects. The large platform metallographic microscope is equipped with a stage with a large moving range, a falling beam illumination device, a flat field achromatic objective lens, a large field eyepiece, clear images, good contrast, and a polarizing device. In addition to its general function, the large platform metallographic microscope is also suitable for observing, researching, and analyzing small targets within a specific range on the surface of large objects.
Therefore, in addition to being used to identify and analyze the microstructure of various metals, alloy materials, and non-metallic substances, the large platform metallographic microscope can also be widely used in the electronics, chemical, and instrumentation industries to observe opaque substances. Such as integrated circuits, electronic chips
Research and analysis of surface conditions of printed circuit boards, LCD panels, wires, fibers, coatings, and other non-metallic materials. It is also suitable for observation and analysis in medicine, agriculture and forestry, public security, schools, and scientific research departments.
2、 System Introduction
The large platform metallographic microscope system combines traditional optical microscopes with computers (digital cameras) through photoelectric conversion. It can not only perform microscopic observations on the eyepiece, but also observe real-time dynamic images on the computer (digital camera) display screen, and edit, save, and print the required images.
3、 Technical parameters:
1. Eyepiece
type |
magnification |
Focal length (mm) |
Field of view (mm) |
Large field eyepiece |
10X |
25 | Φ18 |
2. Objective lens
Objective lens type |
magnification |
Numerical Aperture |
Working distance (mm) |
Plan Achromat |
5X |
0.12 |
18.3 |
10X |
0.25 |
8.9 |
|
| 20X | 0.40 | 8.7 | |
| 40X | 0.60 | 3.7 | |
80X |
0.80 |
0.96 |
3. Optical magnification: 50X 100X 200X 400X 800X
3. Optical magnification: 50X 100X 200X 400X 800X
4. System reference magnification: 50X-2600X
5. Fallout Illuminator: 6V/20W halogen lamp, adjustable brightness
6. Color filter group: yellow, blue, green, frosted glass
7. Polarization device: insertable polarizer and built-in polarizer for three eyes
8. Stage: (equipped with a fast moving device)
Size: 250 * 230mm Mobile range: 153 * 153mm [Standard]
Size: 274 * 274mm Mobile range: 203 * 203mm [optional]
9. Coarse micro coaxial focusing mechanism, micro handwheel grid value: 0.002mm
10. Pupil distance adjustment range: 53-75mm
11. Anti mold: Unique anti mold system
4、 System composition:
Computer based Large Platform Metallographic Microscope (CMM-DAE): 1, Metallographic Microscope 2, Adaptor 3, Camera (CCD) 4, A/D (Image Acquisition) 5, Computer
Digital camera type large platform metallographic microscope CMM-DAZ: 1, metallographic microscope 2, adapter lens 3, digital camera.
Digital microscopy imaging system Computer microscopy imaging system
5、 Optional parts for the instrument:
1. Eyepiece: 20X 10X division. 2. Objective: 50X 60X 100X (oil)
3. High pixel imaging system 4. Metallographic image measurement software CF-2000C
5. Metallographic structure analysis software (quantitative) CF-2000JX
On site analysis and selectionFactory laboratory selectionSelection of University Laboratories