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4th Floor, Building 2, Zhongke Keyi Building, No. 13 Zhongguancun North Second Street, Haidian District, Beijing
Beijing Zhongke Keyi Optoelectronic Technology Co., Ltd
KYKY-EM81 series field emission scanning electron microscope
NegotiableUpdate on 05/07
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Overview
The KYKY-EM8100 high-resolution field emission scanning electron microscope adopts a new electronic optical design such as barrel acceleration technology and low aberration conical objective lens, which can achieve sub nanometer level imaging effects at low voltage. It has wide applicability to various materials and can meet the testing needs of multiple scientific research and industrial fields.
Product Details
1、 Product Features
Sub nanometer resolution
Low aberration conical objective lens
Large beam current
Automated control system
Large sample warehouse
Tube acceleration technology significantly reduces color difference under low pressureHigh qualityimaging
2、 Technical parameters
3、 Product Features
01 Secondary electronic detector
·High signal-to-noise ratio, high bandwidth and large depth of field, characterizing the surface morphology and structure of the sample
02 Simultaneous imaging of different detectors
·Display SE and BSE dual channel images
·Different detectors can be set arbitrarilySignal mixing ratio
·BSE detector, reflecting sampleComposition characteristics of the product surface
03 Cathodic Fluorescence Imaging
04 Large image stitching
·Automatic planning of the full field of view matrix for the sample area, with no need for manual intervention in the photography process
·Quickly concatenate real-time previews of hundreds or thousands of data volumes to create clear scanned images of the entire area
05 Particle size analysis
Using a composite image processing algorithm based on deep learning, the scale is automatically recognized, particles in the image are accurately identified, and various morphological parameters are statistically analyzed and exported for a more comprehensive granularity analysis
And particle shape statistics.
06 Key dimension measurement
Equipped with rich image measurement functions such as distance, angle, horizontal/vertical line/circle diameter calculation, etc
4、 Customization capability
1. Electron Beam Exposure (EBL)
The electron beam exposure system (EBL) based on scanning electron microscopy can accurately control the scanning path and energy sink of the electron beamAccumulate to achieve high-resolution graphic exposure. The system adopts excellent electron beam scanning control technology and supports flexibilityThe diverse pattern design and precise control not only have the function of electron beam exposure, but also retain the observation function of the original SEM,This allows users to observe and process samples on the same device, improving work efficiency and convenience.
2. Vacuum Interconnection
·Vacuum interconnected scanning electron microscopy is used for automatic detection of products transmitted from sample vehicles, analyzing their surface grain morphology, size distribution, and other informationEvaluate the film quality of the thin film.
·The vacuum interconnect system can process samples under vacuum conditionsPreprocess and transfer to scanning electron microscopy for observation.
·Automatic detection and feedback system for sample labels and locationsMonitor and record the status and sample handover to ensure clarityClear understanding of sample transportation status.
3. Laser combined with ultrafast electron microscopy
·Ultrafast electron microscopy uses external stimuli such as lasers and electric fields to excite the sample. Use another laser with adjustable time delay to act on electricity
Mirror filaments generate pulsed electron beams to irradiate the surface of the sample and collect secondary electrons escaping from the surface to characterize the excitation transient.
5、 Application Cases
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