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Shenzhen Changlilai Technology Co., Ltd
Italian Sego colorimetric residual chlorine analyzer
NegotiableUpdate on 05/11
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Overview
The SEKO residual chlorine analyzer uses a colorimetric method to detect residual chlorine. The colorimetric residual chlorine online analyzer uses the DPD colorimetric method to detect the concentration of residual chlorine. It is an instrument with accurate measurement, high cost-effectiveness, and low maintenance, suitable for measuring residual chlorine during chlorination and monitoring residual chlorine concentration in drinking water pipelines.
Product Details
Detailed introduction of the Italian Sego colorimetric residual chlorine analyzer
SEKO residual chlorine analysis residual chlorine online analyzer uses colorimetric method to detect residual chlorine value, and the colorimetric residual chlorine online analyzer adopts wall mounted installation. The reagent usage for continuous operation for 30 days (based on a 5-minute measurement cycle) enables unmanned operation with low operation and maintenance costs. This product is generally suitable for residual chlorine measurement in chlorination processes such as tap water, circulating cooling water, and sewage, as well as residual chlorine measurement in tap water pipelines.
Measurement range: 0-5ppm,
Accuracy: ± 5% reading or ± 0.03ppm Cl2, whichever is greater,
Detection limit: 0.03mg/L,
Display: 70mm x 48mm LCD display,
Correction: Use the default correction curve,
Sample flow rate: 200-400mL/min,
Sample inlet pressure: 0.1~5bar,
Sample temperature: 5-40 ℃,
Power supply: 220-230VAC, 50/60Hz,
Output: 4-20mA,
Communication: MODBUS RS485,
Relays: 2 sets of relays, capable of setting concentration alarms,
Storage temperature range: -15 ℃ to 60 ℃,
Storage humidity: 10-90%, non condensing,
Instrument size: 350mm * 186mm * 460mm (length * width * height)
Weight: approximately 9KG, installation method: wall mounted.
The slope of the residual chlorine sensor will vary by 65% to 150% based on the normal slope, depending on factors such as different models or applications.
