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E-mail
szhuaweina1@163.com
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13584898152
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A4-107, Biological Nano Park, No. 218 Xinghu Street, Suzhou Industrial Park
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Suzhou Huawei Nano Technology Co., Ltd
HWN-L6 New Nano Laser Direct Writing System
NegotiableUpdate on 12/18
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Overview
The HWN-L6 novel nano laser direct writing system is a large-area, high-precision, stackable, and ultra diffraction limited laser direct writing system that can be used for large-area micro nano processing of wafer sizes. It is suitable for the manufacturing of various micro nano structures and devices, as well as the production of small batch micro nano devices. This series includes different models such as L50 and L100, which have powerful functions, simple maintenance, high processing resolution, support for multiple engraving modes, and support for multiple receptor materials. At the beginning of the design, this system reserved sufficient physical space and hardware resources to meet the needs of subsequent functional upgrades and replacements, making the product have a longer lifecycle
Product Details
HWN-L6 New Nano Laser Direct Writing SystemProficient in research and development of wafer sizes and small-scale production
HWN-L6 New Nano Laser Direct Writing SystemIt is a laser direct writing system with large area, high precision, can be engraved, and super diffraction limit processing. It can be used for large-area micro nano processing of wafer size, suitable for various micro nano structures and device manufacturing, small batch micro nano device production, etc. This series includes different models such as L50 and L100, which have powerful functions, simple maintenance, high processing resolution, support for multiple engraving modes, and support for multiple receptor materials. In addition, this system has reserved sufficient physical space and hardware resources at the beginning of design to meet the needs of subsequent functional upgrades and replacements, making the product have a longer lifecycle.
Suzhou Huawei Nanotechnology Co., Ltd. is a high-tech innovative company registered and established in 2011, mainly engaged in the research and industrialization of new nanolithography technology and maskless nanolithography machines.