Focused X-ray photoelectron spectrometer

The PHI Genesis 500 is a new generation equipped with fully automatic multifunctional scanning focused X-ray photoelectron spectroscopy, easy-to-use multifunctional optional accessories, which can achieve fully automatic sample transfer and parking. At the same time, it also has high-performance large-area and micro area XPS analysis, fast and accurate deep analysis, providing comprehensive solutions for batteries, semiconductors, organic devices, and other fields.

simple and easy to operate

PHI GENESIS provides a brand new user experience with high-performance, fully automated, and easy to operate instruments.

The operation interface can set both regular and advanced multifunctional testing parameters on the same screen, while retaining functions such as sample photo navigation and accurate positioning of SXI secondary electronic images.

Simple and user-friendly interface

Multi functional optional accessories

In situ multifunctional automated analysis covers a full range of techniques from LEIPS testing of conduction bands to HAXPES core level excitation. Compared to traditional XPS, PHI GENESIS demonstrates excellent performance value.

Comprehensive and excellent solutions:

High performance XPS, UPS, LEIPS, REELS, AES, GCIB, and various other optional accessories can meet all surface analysis needs.

Large area analysis of most samples

After placing the prepared sample holder into the injection chamber, it will be automatically transferred into the analysis chamber

Can use three sample holders simultaneously

The 80mm × 80mm large sample holder can hold multiple samples

Can analyze various samples such as powders, rough surfaces, insulators, and complex shapes

Standard sample holder 40mm × 40mm large sample holder 80mm × 80mm

Micro area X-ray beam spot that can focus ≤ 5 μ m

In PHI GENESIS, the focused scanning X-ray source can excite secondary electron imaging (SXI), which can be used for navigation, accurate positioning, multi-point and multi area simultaneous analysis and testing, as well as depth analysis.

Quick and in-depth analysis

PHI GENESIS can achieve high-performance deep analysis. Focusing X-ray sources, high-sensitivity detectors, high-performance argon ion equipment, and efficient dual beam neutralization systems can achieve fully automatic depth analysis, including simultaneous analysis at multiple points within the same sputtering etching pit.

Angle resolved XPS analysis

The high sensitivity micro area analysis and highly reproducible neutralization performance of PHI GENESIS XPS ensure the performance of angular resolution analysis of samples. In addition, the combination of sample tilt and sample rotation can simultaneously achieve high resolution of angle and high resolution of energy.

Application field

Mainly used in solid materials and device fields such as batteries, semiconductors, photovoltaics, new energy, organic devices, nanoparticles, catalysts, metal materials, polymers, ceramics, etc.

Functional materials used in all solid state batteries, semiconductors, photovoltaics, catalysts, and other fields are complex multi-component materials, and their development relies on continuous optimization of chemical structure and performance. The new surface analysis instrument "PHI GENESIS" provided by ULVAC-PHI, Inc. is a fully automatic and multifunctional scanning focused X-ray photoelectron spectrometer with performance, high automation, and flexible scalability, which can meet all analysis needs of customers.

Multi functional optional accessories

UPS ultraviolet photoelectron spectroscopy, LEIPS low-energy reflective electron spectroscopy, AES/SAM Auger electron spectroscopy, REELS reflective energy loss spectroscopy, dual anode X-ray sources (Mg/Zr, Mg/Al), Ar GCIB argon cluster ion source, Ar GCIB cluster size measurement tool, C60 cluster ion source (20KV), sample heating and cooling module, 4-electrical contact heating and cooling module, sample protection transfer module, SPS sample positioning system, etc.

floor plan

Installation requirements