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Coherent® LightSmyth™ Nano patterned silicon seal

NegotiableUpdate on 02/03
Model
Nature of the Manufacturer
Producers
Product Category
Place of Origin
Overview
Coherent #174; LightSmyth Nano patterned silicon stamp $r $n Nano scale textured groove surface $r $n Variable groove period and groove depth $r $n Ideal choice for nanophotonics research and application
Product Details

Coherent ® LightSmyth ™ Nano patterned silicon seal

Nano scale textured groove surface

Variable groove period and groove depth

Ideal choice for research and application of nanophotonics


General Specifications

Coating:
Uncoated
Construction:
RIE Grating
basal:
Single Crystal Silicon
Surface quality:
60-40 (within CA)
Thickness (mm):
0.68 ±0.05


model

Product Code Period (nm) Size (mm)
16-855 855 ±42.75 12.50 x 12.50
16-856 855 ±42.75 25.00 x 25.00
16-857 139 ±6.95 12.50 x 12.50
16-858 139 ±6.95 25.00 x 25.00


Detailed information

Coherent ® LightSmyth ™ The nano patterned silicon seal is composed of a nano scale textured surface formed with patterns on a single crystal silicon substrate. Through reactive ion etching, linear grooves with trapezoidal cross-sections are etched onto the substrate surface, similar to traditional gratings. The etching process can provide different cycle and depth specifications for these grooves, as well as more complex patterns such as lattices. II-VI LightSmyth ™ Nano patterned silicon stamps are an ideal choice for nanophotonics research applications in the fields of optics and photonics, biology, chemistry, nanoimprinting, and microfluidics.

Please note: II-VI Incorporated has been changed to Coherent Corp

Technical data

Coherent® LightSmyth™ 纳米图案硅印章

Coherent® LightSmyth™ 纳米图案硅印章

Coherent® LightSmyth™ 纳米图案硅印章

Coherent® LightSmyth™ 纳米图案硅印章

Coherent® LightSmyth™ 纳米图案硅印章