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E-mail
wulihua@cinv.cn
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Phone
18019703828
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Address
Room 301, Building A, No. 2250 Pudong South Road, Pudong New Area, Shanghai
Shanghai Xinu Optical Technology Co., Ltd
wulihua@cinv.cn
18019703828
Room 301, Building A, No. 2250 Pudong South Road, Pudong New Area, Shanghai
CIS-LIBS Particle Element Analysis SystemFast, accurate, and one click analysis




Multiple devices are required to match:
Merely observing through magnification cannot determine the composition
Need to use multiple devices or commission external analysis
Preprocessing is required:
There are size restrictions on entering the analysis equipment, and it is necessary to destroy or cut off the target object
Need to perform conductivity treatment on the surface of the target object and vacuum treatment inside the analysis equipment
High requirements for the competence of experimenters:
Due to the high professionalism of analytical equipment, only a few people can operate it
Only with professional knowledge can substances be judged based on detected elements

Only one is needed to complete it
Only one device is needed to quickly perform element discrimination from magnified observation. Personnel who need to perform element discrimination can carry out their tasks on the spot
No preprocessing required
There is no limit on the size of the target object, and it can be analyzed directly without damage
Analyze in air without the need for conductivity or vacuum treatment
Easy element discrimination
While observing with a microscope system, element discrimination can be performed with just one click. Based on the internal database, the detected substance can be inferred instantly




CIS-LIBS Particle Element Analysis SystemSpecifications
model |
CIS- LIBS |
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LIBS optical module |
Detection Principle |
Laser induced breakdown spectroscopy |
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Testing nature |
Qualitative and semi quantitative |
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detection capability |
%Level (depending on the element) |
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Testing environment requirements |
None, analysis conducted under atmospheric conditions (none, conducted under normal temperature and pressure conditions) |
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Corresponding elements |
CU、A |
SUS、 Fe、 L |
C、cr 、Mg、Mn |
T |
Y. Common elements such as Zn and Au |
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laser |
laser type |
Nd: YAG (semiconductor pumped) |
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laser wavelength |
355nm |
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Single pulse energy |
<100UJ |
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pulse width |
≤1 . 5ns |
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Point specifications |
15um (type) |
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ablation depth |
1-10um (depending on the material) |
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spectrometer |
spectral range |
200 to 780nm |
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spectral resolution |
0 . 15nm |
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signal-to-noise ratio |
500 |
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detector |
CMOS detector |
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Laser lens |
Lens Type |
Exclusive specification transmissive lens |
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Lens magnification |
7X |
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working distance |
18mm |
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Scanning optical module |
Incident axis |
Differential observation method |
Olympus BX53M, BF Bright Field Lighting |
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objective lens |
5X, 10X,20X,50X |
optional |
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lighting |
High power digital LED, software controllable, with memory mode |
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Polarization system |
Polarized 00 and Polarized 90o automatic digital switching with memory mode |
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digital imaging |
Camera model |
DFK33UX249 |
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camera resolution |
1920x1200 (2 . 3mp) |
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Camera target surface |
2 inches |
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Frame rate |
48FPS |
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Scan the stage |
Carrier platform direction |
XYZ three-axis |
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Itinerary scope |
Xy axis 125x75mm, z axis 35mm |
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resolution |
0 1um (software control) |
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precision |
<5μm |
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Control method |
Software automatic control+remote rod subdivision control |
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generate report |
generation method |
auto-generate |
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Report content |
Single particle material professional report |
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Full Particle Material Professional Report | ||||||||||||
computer |
15 processor, 16GB memory, 1TB hard drive, 22 inch monitor |
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equipment power supply |
power supply method |
AC 220V50Hz |
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warranty period |
Complete machine for 12 months |
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Environmental resistance |
Environmental temperature for use |
+10 to 45 |
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Environmental humidity for use |
To 85% RH (non condensing) |
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weight |
system |
About 50KG |
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Overall dimensions |
Width 490mm x Height 600mm x Depth 840mm |
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