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Shanghai Haoliang Optoelectronic Equipment Co., Ltd
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Shanghai Haoliang Optoelectronic Equipment Co., Ltd

  • E-mail

    info@auniontech.com

  • Phone

    15601689581

  • Address

    3rd Floor, Building 6, No. 2007 Hongmei Road, Xuhui District, Shanghai

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213nm deep ultraviolet single longitudinal mode laser

NegotiableUpdate on 01/09
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Overview

213nm deep ultraviolet single longitudinal mode laser, suitable for optical metrology, 213nm optical system calibration, or bandwidth control of high-power ArF excimer lasers.

Product Details

213nm deep ultraviolet single longitudinal mode laser

The German company Xiton Photonics isDiode pumped solid-state laserandnonlinear opticsExpert in devices. We can develop and manufacture reliable laser systems for almost any desired wavelength, with over 20 years of experience in laser research and development, focusing on deep ultraviolet andUV laserThe device.

IXION SLM 213 is a singlelongitudinal modeAll solid state laser system, suitable forOptical meterCalibration of 213 nanometer optical system or high-power ArFExcimer laserApplications such as bandwidth control. The spectral bandwidth is close to its theoretical Fourier limit.This laser operates within M ²<1.6diffractionShort output pulses with a duration of 6-8 ns are provided in the restricted beam, with a repetition rate between 1 and 15 kHz. At 213nm, the average output power is as high as 100mw, with ultra stable pulse routing and a height of over 1.5mcoherentLength, which traditional lasers cannot achieve.



213nm deep ultraviolet single longitudinal mode laserparameter

Wavelength/wavelength

213 nm

Average power/Average power

100mW

Pulse duration

typ 6-8 ns

Energy per pulse/Single pulse energy

10µJ

Repetition rate/repetition frequency

1-15 kHz

beam quality/Spot quality

M² < 1.6

Spectral bandwidth

< 100 MHz

Product features of deep ultraviolet single longitudinal mode laser:

spectral bandwidth


Spot quality



Application of deep ultraviolet single longitudinal mode laser products:

  • spectrometercalibration

  • photolithography

  • interferemeasurement

  • Wafer inspection

  • Holographic measurement

  • photoluminescence