KLA optical profilometerIn the measurement of ultra-thin film thickness from perovskite cells to semiconductor manufacturing, it has become a key tool due to its high precision, non-contact measurement, and multifunctionality. The specific applications are as follows:
1、 Measurement of ultra-thin film thickness in perovskite solar cells
TCO layer measurement:
Importance: The TCO layer is an important component of perovskite solar cells and must have high transmittance, low resistance, and high thermal stability while maintaining good conductivity.
Measurement example: Using the KLA optical profilometer, the thickness of IZO thin films on glass can be accurately measured, such as samples at 6.8nm and 37.1nm.
ETL layer measurement:
Importance: ETL layer plays a key role in collecting electrons, transporting electrons, and blocking holes to reduce electron hole recombination rate in perovskite solar cells. Its flatness and smoothness directly affect the quality of the perovskite layer.
Measurement example: The KLA optical profilometer can measure the thickness of SnO2 thin films on glass, such as samples at 10.2nm, 14.3nm, and 19.6nm, providing an effective means for monitoring the thickness and uniformity of ETL layers.
Measurement of metal electrode layer:
Importance: The metal electrode layer is the top layer of perovskite solar cells, and controlling its process thickness and uniformity is crucial for reducing costs and improving cell performance.
Measurement example: Using a KLA optical profiler, the thickness of metal aluminum thin films on glass can be measured, such as samples at 15.0nm, 28.0nm, 49.8nm, and 71.1nm.
2、 Measurement of ultra-thin film thickness in semiconductor manufacturing
High precision and repeatability:
KLA's optical profilometer, such as Zeta-20, uses ZDot ™ Technology achieves 3D morphology and true color scanning through dot matrix confocal scanning, with Z-axis resolution reaching sub nanometer level. This high precision and repeatability can meet the strict requirements of the semiconductor industry for film thickness measurement.
Non contact measurement:
KLA's optical profilometer adopts a non-contact measurement method, which avoids the damage and errors that may be caused by contact measurement. This is particularly important for fragile thin film structures in semiconductor manufacturing.
Multifunctionality:
KLA's optical profilometer not only has the function of measuring film thickness, but also can measure parameters such as refractive index, reflectivity, and transmittance, meeting diverse measurement needs. For example, the Zeta-20 optical profilometer supports measurement from nanometer to millimeter level steps and can draw a thin film thickness distribution map on the sample to determine its uniformity.
Easy to operate and maintain:
KLA's optical profilometerIt usually has a user-friendly interface and automated measurement functions, making it easy to operate and maintain. This helps to reduce operational difficulty and improve measurement efficiency.