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Nano 3D Technology (Shanghai) Co., Ltd. Nanoscribe
Nano 3D Nanoscribe, a manufacturer of laser direct writing lithography machines with no mask on metasurfaces, requires the person who tied the bell to untie it!
Date: 2025-10-30Read: 0
Metastructured surfaces are composed of artificial atoms at sub wavelength scales, which require extremely high processing accuracy, surface quality, and design freedom.
As a pioneer in two-photon maskless lithography technology, its Quantum X series maskless laser direct writing equipment is equipped with specialized two-photon grayscale lithography technology, with a minimum feature size of 160nm and a surface roughness of ≤ 10nm. The Quantum X align system has nanometer level alignment accuracy and can manufacture high-resolution three-dimensional structures on optical fibers, chips, and wafers, accurately processing complex structures such as free-form surfaces on metasurfaces. Nano 3D Nanoscribe, as its wholly-owned subsidiary in China, is responsible for promoting and localizing this series of equipment.
Technical features: Focusing on two-photon polymerization (TPP) 3D lithography technology, its Photonic Professional GT series is an industry benchmark.
Advantages: It can achieve true three-dimensional micro nano structure processing, with a resolution of up to hundreds of nanometers or even higher, especially suitable for producing metasurfaces with complex three-dimensional morphology (such as anisotropic nano column arrays).
Applicability: It is an ideal choice for developing advanced and complex 3D metamaterial surfaces.
The demand for sub wavelength structure control of metasurfaces imposes almost stringent requirements on lithography equipment.Nano Nuo 3D NanoscribeThe Quantum X series equipment, with its 160nm three-dimensional transverse feature scale control and surface roughness performance of ≤ 10nm, can easily handle complex structural processing such as free-form surfaces and diffraction arrays. Its core is 2GL ® The efficient integration of grayscale lithography and precise two-photon aggregation technology enables cross dimensional manufacturing from nanoscale to mesoscale by dynamically adjusting laser power at a rate of 1MHz, meeting the precise control requirements of optical phase and amplitude for metamaterial surfaces.
In cutting-edge scientific research, this device has become the key to breaking through technological bottlenecks. A certain team successfully solved the inherent contradiction between "measurement range and resolution" in dispersion confocal technology with the help of its manufactured broadband metamaterial surface, stabilizing the lateral resolution within the 100 micron axial range at 1 micron and improving performance by 2.5 times. In the field of biosensing, researchers have utilized their integrated processing capabilities to print sensors that integrate superhydrophobic structures and nanophotonic components, increasing virus detection sensitivity to 0.1 TCID50/mL and reducing detection time to 15 minutes.