In the thin film manufacturing process, certain metal organic compounds（MOCs）The vapor pressure of precursors such as hydrides and ammonia is much lower than the standard atmospheric pressure（760 Torr）It is difficult to evaporate at room temperature. These precursors need to be transported to chemical vapor deposition(CVD)In the reactor, the traditional method is to use solvents/Solute chemistry and liquid transport. Some solid precursors have solubility limitations, which affect the maximum mass flow rate delivered to the process chamber.

We have adopted advanced pressure measurement and control technology, which can directly control the transportation of solid precursor vapor without the use of solvents, thus achieving precise and repeatable transportation, making the preparation of thin film materials more efficient.

Our low vapor pressure controller is equipped with powerful built-in features to meet the flow range requirements of different fieldsCPUIt can achieve wide range intelligent flow control, with a control range of the entire range10%~100%.

This low vapor pressure controller can be used in30℃~200℃Maintain stable measurement and control within the operating temperature range, suitable for harsh environments. adoptModbusAgreement（RS485/232）Easily connect with computers or other devices for data communication and remote control.

The thin film production process widely used in various industries, such as semiconductor integrated circuit manufacturing, photovoltaic thin film solar cells, new material research and development, medical device biosensors and many other industries, empowers various industries to produce high-quality thin film materials through critical thin film processes.

If you have specific related questions, you can contact the product manager on the page.