The coating of the fully automatic ion sputtering instrument is uniform and has good conductivity, thanks to its magnetron sputtering technology, precision control system, and multi target selection ability. The specific advantages are as follows:

1、 Magnetron sputtering technology ensures the uniformity of the coating

1. Magnetic field optimization design: By adjusting the shape and arrangement of magnets or moving the magnetic field, the uniformity of plasma density is enhanced, and the sputtering rate at different positions of the target surface tends to be consistent, thereby improving the uniformity of the film layer. For example, optimizing the distance between the target material and the substrate can avoid uneven accumulation of sputtered particles and ensure uniform film thickness.

2. Dynamic adjustment of target substrate distance: Experiments have shown that as the distance between the target material and the substrate increases, the difference in film thickness at different points on the substrate gradually decreases, and the uniformity is significantly improved. This feature enables the ion sputtering instrument to adapt to samples of different sizes and shapes, achieving high-precision coating.

3. Coordinated control of sputtering power and vacuum degree: Increasing the sputtering power can expand the illuminated area of the target surface, making the power density more uniform; Increasing the vacuum degree can reduce the collision probability between sputtered atoms and gas atoms inside the chamber, further optimizing the uniformity of film thickness. This dual control mechanism ensures the stability of coating quality.

2、 Precision control system of fully automatic ion sputtering instrument improves conductivity performance

1. Constant current control technology: Using high-precision constant current magnetron DC sputtering power supply, the control accuracy can reach 1mA, ensuring the stability of sputtering current. This stable current output helps to form a dense metal coating, thereby improving the conductivity of the sample.

2. Precise control of vacuum environment: High performance rotary vane vacuum pump is used to quickly achieve a working vacuum environment (maximum vacuum<1Pa), and a full range Pirani vacuum gauge is equipped to monitor the vacuum degree in real time. This precise vacuum control can reduce the impact of impurities on the coating and improve its conductivity.

3. Nano scale sputtering particle control: Sputtering particles can reach the nanometer level (<5nm), and the prepared thin film is dense and uniform. This nanoscale coating not only has excellent conductivity, but also meets the requirements of high-resolution SEM observation.

3、 Fully automatic ion sputtering instrument with multiple target material selection to meet diverse needs

1. Support for precious metal target materials: The ion sputtering instrument supports the selection of various precious metal target materials such as gold, platinum, silver, palladium, etc. These target materials have good conductivity and chemical stability, which can meet the requirements of different samples for coating materials.

2. Convenience of target material replacement: The target head consists of a shielding ring, a pressure ring, and a target material. When replacing the target material, simply loosen the screws of the shielding ring and pressure ring to easily remove the old target material and install a new one. This convenient method of replacing target materials improves the flexibility and efficiency of the equipment.

4、 Practical application verification of fully automatic ion sputtering instrument

1. Optimization of scanning electron microscopy observation: In scanning electron microscopy (SEM) observation, ion sputtering equipment can provide a uniform and well conductive coating for non-conductive samples. This effectively avoids the generation of charging effect, making electron microscopy images clearer and more detailed.

2. High magnification imaging support: For samples that require high magnification imaging, ion sputtering equipment can provide a delicate and uniform conductive metal layer. This helps to achieve observation and imaging at larger magnifications, improving the accuracy and reliability of experiments.