The high vacuum thermal evaporation carbon plating instrument has two core working modes: continuous evaporation and pulse evaporation. Its design meets different process requirements by accurately controlling the evaporation process. The specific explanation is as follows:

1、 Continuous evaporation mode of high vacuum thermal evaporation carbon plating instrument

1. Principle:

By heating a carbon source (such as high-purity carbon fiber or carbon rod) with constant power, it continuously melts and stably evaporates, forming a uniform vapor flow in the vacuum chamber. Gaseous carbon atoms or molecules diffuse in a straight line to the substrate surface and condense layer by layer into a dense solid thin film. This mode relies on a closed-loop temperature control system to maintain a constant evaporation rate and control power fluctuations within ± 1%.

2. Characteristics:

Efficient and stable: Suitable for large-scale coating or scenarios that require rapid film formation, such as SEM sample conductive layer preparation.

Uniform film layer: The steam flow continuously covers the substrate, reducing local thickness differences and ensuring film consistency.

Process simplification: No need to frequently start and stop heating sources, and the operation process is simpler.

3. Application scenarios:

Prepare TEM support film to support ultra-thin slices or nanoparticles.

As a protective layer or conductive layer in surface analysis (such as X-ray energy dispersive spectroscopy (EDS) analysis).

Batch coating demand in the industrial field (such as conductive layers for electronic components).

2、 Pulse evaporation mode of high vacuum thermal evaporation carbon plating instrument

1. Principle:

Using intermittent heating method, carbon source evaporation is controlled by pulse signals. During each pulse cycle, the carbon source rapidly heats up to the evaporation temperature and releases gaseous particles, followed by a pause in heating to allow sufficient deposition of particles on the substrate surface. By adjusting the pulse frequency and duty cycle, the film thickness and particle size can be precisely controlled.

2. Characteristics:

Fine control: suitable for preparing ultra-thin carbon films or nanoscale structures, with film thickness control accuracy up to the nanometer level.

Reduce thermal damage: Intermittent heating reduces substrate temperature rise and avoids the impact of high temperatures on sensitive materials.

Particle refinement: Pulse evaporation reduces the collision of gaseous particles, forming finer film particles.

3. Application scenarios:

Optimization of sample surface features in EBSD analysis requires high-resolution carbon film enhanced signals.

Cell sample coating in the field of biomedicine requires minimizing thermal effects.

Optical component coating (such as anti reflective film) requires precise control of the optical properties of the film layer.

3、 Selection criteria for high vacuum thermal evaporation carbon plating instrument mode

1. Film thickness requirement:

Continuous mode is suitable for preparing thicker film layers (such as μ m level) with higher efficiency.

Pulse mode is suitable for ultra-thin film layers (such as nm level), with better accuracy.

2. Characteristics of base material:

High temperature resistant materials (such as metals) can be selected in continuous mode to shorten process time.

Thermal sensitive materials (such as polymers and biological samples) require pulse mode to avoid deformation.

3. Process complexity:

Simplify the operation of simple coating tasks (such as conductive layers) using continuous mode.

High precision requirements (such as nanostructures) are achieved through pulse mode for precise control.

4、 High vacuum thermal evaporation carbon plating equipment supports functions

1. Vacuum system: combination of turbo molecular pump and rotary vane pump, ultimate vacuum, working vacuum, ensuring pollution-free evaporation process.

2. Steam source management: Four high-purity carbon fiber steam sources can work alternately, automatically detect the on/off status, and extend the service life.

3. Sample stage control: Supports manual/automatic rotation, with adjustable high/low speeds, achieving uniform deposition at multiple angles.

4. Safety protection: Vacuum protection, overcurrent protection, overvoltage protection, etc., to prevent equipment damage caused by abnormal working conditions.