VICI helium purifier and nitrogen

NegotiableUpdate on 05/06

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Overview

VICI helium and nitrogen purifiers: Zhengzhou Ounuo Instrument's stock VICI helium and nitrogen purifiers are used to improve carrier gas purity to avoid affecting detector sensitivity or damaging capillary columns. The Valco helium purifier (HP2) and nitrogen purifier (NP2) use stable adsorbent alloys as purification substrates, which can effectively remove impurities such as H2O, H2, O2, etc. HP2 is suitable for various inert gases such as He, Ne, Ar, while NP2 is specifically designed for N2 gas. Both can operate at an operating pressure of 1000 PSI and have automatic regulation function to maintain purification efficiency

Product Details

VICI helium purifier and nitrogenZhengzhou Ounuo Instrument spot VICI helium and nitrogen purifiers are used to improve the purity of the carrier gas, in order to avoid affecting the sensitivity of the detector or damaging the capillary column. The Valco helium purifier (HP2) and nitrogen purifier (NP2) use stable adsorbent alloys as purification substrates, which can effectively remove impurities such as H2O, H2, O2, etc. HP2 is suitable for various inert gases such as He, Ne, Ar, while NP2 is specifically designed for N2 gas. Both can operate at an operating pressure of 1000 PSI and have automatic regulation function to maintain purification efficiency

VICI helium purifier and nitrogenThe purification of carrier gas is essential in any application that requires high sensitivity, as impure gases can affect the sensitivity of the detector and even damage the capillary column. The Valco helium purifier (HP2) can provide purified gases of helium and other inert gases at any time, such as purifying impure gases below ppm in Ne, Ar, Kr, and Xe. The nitrogen purifier (NP2) also acts on nitrogen gas.

The purification substrate of Valco gas purifier is a non-volatile, heat activated adsorbent alloy, which is stable and contained in the welding components, making it safe and easy to use. There is a layer of oxide film on the surface of the adsorbent particles that needs to be activated by heating. The activation process must be completed in a vacuum or inert gas environment, which allows helium gas to diffuse freely between them and prevents the formation of an oxygen passivation layer. The helium and nitrogen purifiers have an automatic control feature design, which maintains the adsorbent material at temperature and eliminates the possibility of heat loss

Helium purifier

*Purified gases: He, Ne, Ar, Kr, Xe, Rn

*Operating pressure: 1000 PSI

*Impurities can be removed: outlet impurities are less than 10 ppb H2O, H2, O2, N2, NO, NH3, CO, CO2, and CH4, based on a total inlet impurity of 10 ppm. Other impurities removed include CF4, CCl4, SiH4, and light hydrocarbons.

*Impurities not removed: He, Ne, Ar, Kr, Xe, Rn

Nitrogen purifier

*Purified gas: only N2

*Operating pressure: 1000 PSI

*Impurities can be removed: outlet impurities are less than 10 ppb H2O, H2, O2, NO, NH3, CO, CO2, and CH4, based on a total inlet impurity of 10 ppm. Other impurities removed include CF4, CCl4, SiH4, and light hydrocarbons.

*Impurities not removed: He, Ne, Ar, Kr, Xe, Rn, N2