Polarized metallographic microscope HR-40MCX18MP

NegotiableUpdate on 07/11

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

Product Name: Polarized Metallographic Microscope HR-40M18MP Magnification: 50X~500X Industry Applications: Semiconductor Wafer, ITO Circuit

Product Details

Detailed Introduction

Product Name: Polarizationmetallurgical microscopeHR-40M18MP

Magnification factor: 50X~500X

Industry applications: semiconductor wafers, ITO circuits. Metallurgical forging and other industries

High definition imaging metallographic microscope sharp

High resolution/True color restoration/Easy to operate

偏光金相显微镜

Six core technologies:

High definition lens

Lens focusing

easy operation

Video recording capability

Adjustable light source

Imported chips

Double disc automatic grinding and polishing machine

optical system	Infinite chromatic aberration correction optical system
Observing Jane	30 ° tilt, infinitely distant compared to chain binocular observation, pupillary distance adjustment: 54mm~75mm, unilateral visual acuity adjustment: 5 diopters
Observing Jane	30 ° tilt, infinitely distant compared to chain three-way observation, pupillary distance adjustment: 54mm~75mm, unilateral visual acuity adjustment: 5 diopters, two spectral ratios R: T=100:0 or 50:50
eyepiece	High eye point, large field of view, flat field eyepiece PL10X22mm
	High eye point, large field of view, flat field eyepiece PL10X22mm (with micrometer)
	High eye point, large field of view, flat field, eye lock PL10X22mm (adjustable visibility)
	High eye point, large field of view, flat field eyepiece PL15X16mm
objective	Flat field infinite working distance achromatic metallographic objective lens (5X, 10X, 20X, 50X, 100X)
objective	Infinite distance half band correction ring objective lens (50X)
Wuzhen Converter	Internal positioning five hole converter
Coarse and micro focusing mechanism	Dual purpose rack with transparency and reflection, low hand position coarse and micro coaxial focusing mechanism, coarse adjustment stroke of 28mm, fine adjustment accuracy of 0.002mm. Equipped with anti sliding adjustment elastic device and random upper limit device. Equipped with a platform position up and down adjustment mechanism, the maximum sample height is 28mm
Coarse and micro focusing mechanism	Reflective frame, low hand position coarse micro coaxial focusing mechanism, coarse adjustment stroke of 28mm, fine adjustment accuracy of 0.002mm. Equipped with anti slip adjustment elastic device and random upper limit device. Equipped with a platform position up and down adjustment mechanism, the maximum sample height is 78mm
stage	Double layer mechanical mobile platform, with coaxial adjustment in the X and Y directions at low hand positions; Platform area 175X145mm, movement range: 76mmX42mm
stage	Can be equipped with reflective metal carrier platform and transparent/reflective glass carrier platform
Upper lighting system	Adaptive wide voltage 100V-240V_AC50/60Hz, reflector chamber, single high-power 5WLED, warm color, Kola lighting, with field of view light and aperture shutter, adjustable center, with oblique lighting device
Lower lighting system	Adaptive wide voltage 100V-240V_AC50/60Hz, transmission lamp room, single high-power 5WLED, warm color
condenser	Transmission shake out achromatic condenser lens (NA0.9) with variable aperture stop and adjustable center
Other Accessory	Transmission filters: yellow, IF550 filter, LBD filter, neutral filter
	Photography and camera accessories: 1X, 0.67X, 0.5XC interface, adjustable focus; 3.2X photography eyepiece, camera mount (with PK or MD mount) digital camera relay lens
	Reflective interference filter: blue ≤ 480nm; green 520nm~570nm; Red 630~750nm; LBD
	High precision micrometer with a grid value of 0.01mm