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Plasma cleaning machine

NegotiableUpdate on 05/06
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Overview

As a micro solid surface treatment equipment, plasma cleaning machine is a new surface treatment solution. Plasma is a state of matter, also known as the fourth state of matter. Applying sufficient energy to a gas to ionize it becomes a plasma state. The "active" components of plasma include ions, electrons, active groups, excited state nuclides (metastable states), photons, etc. Plasma cleaning machine is used to treat the surface of samples by utilizing the properties of these active components, thereby achieving cleaning and other purposes.

Product Details

Plasma cleaning machineAs a micro solid surface treatment device, it is a new surface treatment solution. Plasma is a state of matter, also known as the fourth state of matter. Applying sufficient energy to a gas to ionize it becomes a plasma state. plasmaactivityThe components include: ions, electrons, active groups, excited state nuclides (metastable), photons, etc.Plasma cleaning machineIt is to treat the surface of the sample by utilizing the properties of these active components, in order to achieve cleaning and other purposes.

Mainly used in semiconductors, coating processesPCBProcessPCBBefore process and component packagingCOGPrecision cleaning in industries such as vacuum electronics, connectors, and relays, activation of surfaces such as plastics, rubber, metals, and ceramics, and life science experiments.

The cleaning machine is equipped with a high-purity quartz chamber and adopts a new electrode structure design and solid-state power supply technology, which increases its effective volume, makes it easy to match under different vacuum gas environments, and has stable control frequency. The vacuum chamber door has an observation window, which allows for a visual representation of the object processing process. Its RF power supply and control are assembled in one chassis, reducing space occupation and making it easier to operate and place. Compared with large cleaning machines, the detection and control functions can be set up on one panel, making it particularly suitable for scientific experiment sample cleaning and teaching.

Device Model

Z5KQX

S2DQX

Control method

7Inch touch screen human-machine interface

7Inch touch screen human-machine interface

power supply

AC220VAC110Voptional)

operating current

The working current of the whole machine is not greater than3.5A(Excluding vacuum pump)

RF power supply power

500W

150W

matching method

auto-matching

manual matching

Cleaning frequency

40KHz

13.56MHz

coupling method

Capacitive coupling

Working vacuum

≤30Pa

≤50Pa

Material of the cavity

high-purity quartz

cavity volume

5L(inner diameterΦ152mmXdepth280mm)

2L(inner diameterΦ110mmXdepth220mm)

Observation window inner diameter

Φ50

Φ50

gas flow rate

0-50ml/min(Thermal mass flow sensor)X2A)

Vacuum gauge range

1E5Pato1E-1Pa(Pirani vacuum gauge)

process control

Auto Switch

Manual matching and automatic switching

cleaning time

automatic switch

Opening method

Hinged side open flange

Overall dimensions

450*450*250mm

450*450*360mm

Vacuum chamber temperature

less than65°C

cooling method

forced air cooling

standard configuration

KF16vacuum tube1Mi,kf16clamp2A stainless steel mesh box1One power cord and one manual.