Metalens wavefront phase analysis system

The existing challenges and manufacturing difficulties of superlenses

Due to the nanoscale structure and subwavelength working mode of superlenses, their optical metrology faces challenges in research and development, manufacturing, and detection processes. Traditional low resolution techniques are difficult to accurately measure the complex features of superlenses. In order to achieve sub wavelength resolution, special techniques such as electron microscopy or scanning probe microscopy must be used. In addition, the manufacturing tolerances of superlenses can also affect their performance, so accurate characterization is crucial for evaluating their performance.
The sensitivity of superlens to polarization further increases the difficulty of measurement, therefore it is necessary to measure different polarization states. In order to achieve multispectral performance, it is also necessary to use * technology with high spectral resolution. In addition, accurate analysis of wavefront is crucial for evaluating the wavefront shaping ability of superlenses. At the same time, stability testing of the environment is also essential to ensure consistent performance of the superlens.

In response to these challenges, Phasics has launched a comprehensive solution that can simultaneously meet the needs of polarization sensitivity, multispectral performance, high-precision wavefront analysis, and environmental stability of superlenses.

Phasics' four wave transverse shear interferometry technology can provide targeted optical characterization of superlenses to provide corresponding solutions, and meet the following requirements:

-High precision measurement at sub wavelength spatial scale: Phasics' wavefront sensor not only has optical path difference measurement accuracy better than 2nm RMS, but also adopts a convenient C-end interface design, which can directly connect to a microscope, achieving plug and play fast installation and sub wavelength level spatial resolution.

-Polarization independence: Phasics' wavefront sensor supports comprehensive polarization measurement and can accurately analyze the optical response of metasurfaces under different polarization states, thereby better evaluating the actual performance of the device.

-Multispectral measurement capability: Its products can perform high-precision measurements in multiple wavelength ranges, ensuring the performance of superlenses in multispectral applications.

-Environmental stability: Phasics' sensors can maintain accurate measurements under unstable environmental conditions, eliminate interference from environmental factors on measurement results, and ensure data reliability.

Through Phasics' * measurement technology, researchers are able to comprehensively address various challenges in the field of metrology posed by superlens and metasurfaces, driving the widespread application of these revolutionary technologies in imaging, laser systems, and optical computing.

Phasics metasurface measurement optical path construction

In the example shown in Figure 1, the simple phase shift of the metasurface was measured. Phasics' high-precision wavefront sensor can detect local phase defects caused by production errors, which can help evaluate and adjust manufacturing processes, ensuring the production quality of metasurfaces.

Figure 1: Optical characterization of metasurfaces based on four wave transverse shear interferometry

CNRS CRHEA Laboratory in France, S. Khadir arXiv: 2008.11369v1

Figure 2 illustrates the measurement of a Pancharatnam Berry (PB) superlenses using two different circularly polarized states: right-handed and left-handed. According to the design, when the polarization state is changed, the hyper lens will generate a positive lens or a negative lens.

Figure 2: The phase diagram of wavefront curvature is displayed on the left, and the corresponding curve contour is shown on the right. The intermediate phase map displays the residual wavefront error after filtering out the wavefront curvature.

Phasics' QWLSI technology is not affected by polarization, so our device can still provide detailed characterization of the wavefront when switching from right-handed circular polarization to left-handed circular polarization. Figure 2 shows the variation of wavefront curvature. In addition, residual wavefront errors can be revealed by filtering out the main wavefront curvatures, which reflect defects at higher spatial frequencies (see the left phase diagram in the middle of Figure 2).