Laboratory lithography machine

NegotiableUpdate on 01/22

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

Laboratory lithography machine parameters: 1. Exposure area: 160mm * 160mm. 2. Exposure resolution: Contact exposure 0.8um-1um. 3. Alignment accuracy:; 1-1.5um. 4. Light source intensity: 35mW/cm2. 5. UV light source: imported LED module.

Product Details

Product parameters of laboratory lithography machine:

1. Exposure area: 160mm * 160mm

2. Exposure resolution: Contact exposure 0.8um-1um

3. Alignment accuracy: ± 1-1.5um

4. Light source intensity: 35mW/cm2

5. UV light source: imported LED module

6. Exposure center wavelength: 365nm

7. Light source lifespan: 10000 hours, light source parallelism: ≤ 2 °

8. Exposure resolution: Contact exposure 0.8um-1um

9. Uneven illumination: ≤ 3%

10. Exposure setting: timed

11. Executable exposure modes: vacuum contact, hard contact, pressure contact, proximity type

12. Gap setting method: Digital setting exposure gap 0-1200um

13. Adjustable, can automatically separate and eliminate gaps

14. Relative movement range of sample and mask: X: ± 5mm, Y: ± 5mm, 0=± 6 °

15. Mask template leveling method: ball air floating automatic leveling

16. Supports mask template sizes: 1 piece each for 3'x3 ', 4'x4', 5'x5 ', and 7'x7'

17. Standard mounting table: 2-inch, 3-inch, 4-inch, 6-inch

18. Standard accessories compatible with sample thickness: 0.1-5mm, other sizes can be customized

19. Alignment system: optical+CCD, magnification: adjustable from 150x to 720x

20. Dual objective adjustable distance range: 30mm-120mm