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6th Floor, Building 8, Lane 4855, Guangfulin Road, Songjiang District, Shanghai
Shanghai Xihao Industrial Co., Ltd
6th Floor, Building 8, Lane 4855, Guangfulin Road, Songjiang District, Shanghai

HORIBA/Horiba SLIA-5000Silicon dioxide analyzerProduct details:
The management of silicon dioxide (SiO2) is crucial for preventing the formation of scale. This is because the presence of scale in turbines can reduce power generation efficiency, especially for thermal and nuclear power plants. Through HORIBA for many yearsWith technical experience in the field of analysis, we have developed the SLIA-5000 silica water quality analyzer with excellent stability and maintainability, which is used to measure trace amounts of silica in boiler water and pure water.
Product Features:
Measurement time 5 minutes, repeatability ± 2% F.S
Has extremely fast response speed and high repeatability in measurement results.
wide range
Measurement can be achieved from high sensitivity of 0-10 μ g/L to high concentration of 0-5.0 mg/L.
self-diagnostic function
Self diagnosis of various abnormalities, such as sampling or reagent supply abnormalities, calibration abnormalities, light source abnormalities, and internal temperature abnormalities.
Automatic calibration function
Automatic zero point calibration and range calibration can be preset to be performed at specific times for each measurement.
Capable of automatically switching measurement cycles
Automatically shorten the measurement cycle when the sampling concentration exceeds the set concentration range, and automatically extend the measurement cycle when the sampling concentration is below the set concentration range, which can save power and reagents.
Improve operability
Equipped with a color LCD touch screen, it has strong operability.
HORIBA/Horiba SLIA-5000Silicon dioxide analyzerProduct parameters:

More product recommendations:
High sensitivity silica concentration meter SLIA-300
Meet the customer's demand for measuring ultra-low density silica with high sensitivity of 0.01 µ g/L (0.01 ppb).The ultrapure water used in semiconductor production processes can be further purified by using ion exchange resins. Rapid capture of dissolved silica from ion exchange resins can control the quality of ultrapure water, which is crucial for the manufacturing processVery important.HORIBA Advanced Techno has developed and adopted a new 'long optical path length measurement unit' that can perform high-sensitivity measurements on ultra-low density silica, while also providing a compact desktop model,To enhance practicality.This product has a series of standard functions such as self diagnosis, as well as new performance improvements such as high-speed response and high sensitivity, providing stronger support for pure water processes in semiconductor production processes.

Product Parameters:
