The plasma sputtering coating instrument is an upgraded version of magnetron sputtering technology, which significantly improves the performance of thin films by enhancing plasma density and ionization rate. The core process includes:

• Plasma enhancement: Utilizing radio frequency (RF), pulsed power, or high-power pulsed magnetron sputtering (HiPIMS) to generate high-density plasma, ionizing more sputtered particles into ions.

• Ion assisted deposition: High energy ions bombard the substrate to enhance film density, adhesion, and reduce defects.