CIOE China Light Expo is hot, and Younikon invites you to attend the event together!
Date: 2024-09-02Read: 0
This year's CIOE China Optoelectronics Expo brings together over 3700 high-quality exhibitors from more than 30 countries and regions around the world. As a comprehensive exhibition covering the entire optoelectronic industry chain, it covers areas such as information communication, precision optics, camera technology and applications, laser and intelligent manufacturing, infrared, ultraviolet, intelligent sensing, and new displays. Younikon will participate in the 25th China Optoelectronics Expo!
We sincerely invite you to visit the exhibition
Younikon will showcase multiple film thickness gauges at the exhibition
Looking forward to discussing various applications of film thickness measurement with you on site!
There are more fun interactions on site, waiting for you to win prizes~
Unicon in Hall 3 of Shenzhen International Convention and Exhibition Center
Exhibition Hall Preview
Nikon booth3B22
Booth Preview
More surprise activities are gradually being unlocked
Fun prizes? Get involved!
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F50 film thickness measuring instrument |
F50 can easily achieve maximum straightThickness distribution map of sample film with a diameter of 450 millimeters. Using an r - θ polar coordinate moving platform,Can quickly locate the required test points and obtain real-time test thickness, approximatelyTest two points per second. |
Related applications:Semiconductor manufacturing (photoresist, oxide/nitride/SOI, wafer backside grinding); LCD liquid crystal display (polyimide, ITO transparent conductive film); Optical coating (hard coating, anti reflection layer); MEMS microelectromechanical systems (photoresist, silicon-based film layers). |
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The P-7 can perform 2D and 3D measurements of step height, roughness, curvature, and stress, with a scanning range of up to 150mm without the need for image stitching. |
Related applications:Thin film/thick film step; Etching depth measurement; Photoresist/photoresist step; Flexible film; Surface roughness/flatness characterization; Surface curvature and contour analysis; 2D stress measurement of thin films; Surface structure analysis; 3D contour imaging of the surface; Defect characterization and defect analysis. |
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F54-XY-200 thin film thickness measuring instrument |
F54-XY-200 is equipped with an automated thin film thickness drawing system,With the advanced spectral reflectance system of F54-XY-200, the film thickness of samples up to 200 x 200mm can be quickly and easily measured. |
Related applications:Semiconductor manufacturing (photoresist, oxide/nitride/SOI, wafer backside grinding); LCD liquid crystal display (polyimide, ITO transparent conductive film); Optical coating (hard coating, anti reflection layer); MEMS microelectromechanical systems (photoresist, silicon-based film layers). |
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Profilm3D White Light Interference Optical Profilometer |
Profilm3D combines advanced vertical interference scanning (WLI) with high-precision phase interference (PSI) technology. Realize sub nanometer level surface morphology research with strong cost-effectiveness. |
Related applications:Roughness measurement; Three dimensional morphology characterization; Step height measurement |
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FS-1 multi wavelength ellipsometer |
The Film Sense FS-1 multi wavelength ellipsometer uses a long-life LED light source and a non moving component ellipsometer detector, which can achieve reliable thin film measurement in a compact ellipsometer with simple operation. |
Related applications:Silicon dioxide and nitrides, high dielectric and low dielectric materials, amorphous and polycrystalline materials, silicon thin films, photoresist.High and low index thin films, such as SiO2, TiO2, Ta2O5, MgF2.TCO (such as ITO), amorphous silicon thin films, organic thin films (OLED technology), etc |
