In the precision processes of semiconductor and photovoltaic manufacturing, diffusion furnaces are one of the core equipment used to achieve precise doping and thin film growth. Aitory gas mass flow meters and gas mass flow controllers play a key role in this process, as they directly determine the success or failure of diffusion processes and the final performance of products through precise measurement and control of process gases.

In the complex gas path system of the diffusion furnace, the gas mass flow meter (MFM) and gas mass flow controller (MFC) of Atoli are mainly used in the following core links:

Process gas transportation and control: The Aituoli MFC is capable of precise measurement and real-time control of reaction gases (such as oxygen, nitrogen, argon, etc.) entering the diffusion furnace. For example, the MFC330 series can provide small flow specifications as low as 0-5 SCCM, ensuring that dopant concentration and distribution meet stringent process requirements.

Gas distribution and mixing: In situations where multiple gases need to be mixed in specific proportions, multiple Aituoli MFMs or MFCs can work together to accurately measure the flow rate of each gas, thereby ensuring the uniformity and stability of the mixed gas composition and creating an ideal environment for diffusion reactions.

Safety and exhaust treatment: The Aituoli flow equipment can monitor the exhaust emission flow, providing data support for process optimization and environmental compliance. At the same time, it can also ensure the reliable supply of safe gases such as blowing, improving the safety of the entire system.

💡 The core technological advantages of Aituoli products

The reason why the Aituoli gas mass flowmeter/controller is competent for the application of diffusion furnaces is due to its multiple core technical characteristics:

High precision and repeatability: Aituoli products have high precision and very low zero drift characteristics. Taking the MFC330 series as an example, its accuracy can reach ± 0.5% F.S., with a repeatability of ± 0.2% F.S., ensuring consistency in the performance of each batch of products.

Wide range ratio and fast response: Equipment response time is generally less than 1 second, which can quickly keep up with the switching of process steps. The flow measurement range of MFC330 series can reach 2%~100% F.S., which can meet the requirements of small flow control under stable working conditions and also adapt to higher flow demands.

Multi gas compatibility and high cleanliness materials: The Etuoli flowmeter supports multiple gas measurements, such as the MFC300 series, which is compatible with various gases such as Air, N2, O2, H2, etc. The gas contact part is usually made of high-purity and corrosion-resistant materials such as SUS316L stainless steel, and provides highly polished flow channels to effectively prevent gas pollution and ensure the purity of semiconductor processes.

Flexible communication and integration capabilities: The Etuoli flowmeter supports multiple communication protocols, such as the MFC330 series which supports RS232, RS485, CAN, as well as 0-5VDC, 4-20mA analog signals. It can be easily integrated into the central control system of the diffusion furnace to achieve automated production and data monitoring.

🛠️ Selection and application suggestions

When choosing an Etuoli gas mass flowmeter/controller for a diffusion furnace, it is recommended to pay attention to the following points:

Confirm the medium and range: Firstly, it is necessary to clarify the composition of the gas to be measured (whether it is corrosive) and the flow range. The model that covers the minimum and maximum flow rates required for the process should be selected. For example, for trace doping, MFM610 can be chosen, with a minimum range of 0-5 sccm.

Pay attention to pressure and connection: Check the working pressure difference and maximum pressure resistance of the equipment, for example, the MFC300 series has a working pressure difference of 0-1MPa and a pressure resistance of 1.1MPa. At the same time, confirm whether the form of the air circuit connector (such as M8 * 1 thread, quick twist, etc.) matches the existing pipeline.

Preferred control model: If the process requires real-time adjustment of gas flow rate, it is necessary to choose a gas mass flow controller (MFC); If only monitoring is required, a gas mass flow meter (MFM) is sufficient.

Standardized installation and operation: During installation, it is necessary to ensure that the pipeline is clean, pay attention to the horizontal installation direction calibration, and ensure that there is sufficient straight pipe section upstream of the equipment (usually recommended not less than 10 times the pipe diameter) to ensure stable flow and accurate measurement.

💎 summary

The Aituoli gas mass flowmeter and controller play a crucial role in the process gas control of diffusion furnaces due to their high precision, fast response, excellent stability, and powerful system integration capabilities. They are key components that ensure the performance and yield of semiconductor and photovoltaic devices.