Since the 1960s, CVD method has not only been applied in the fields of special composite materials, atomic reactor materials, cutting tools, heat-resistant and corrosion-resistant coatings in the aerospace industry, but also in the semiconductor industry. Although it was relatively late, today it is the most advanced technology for large-scale integrated circuits and thin film preparation of ferroelectric materials, insulation materials, and magnetic materials. CVD method for preparing thin film materials is a successful process in semiconductor and large-scale integrated circuit applications in recent years. It is mainly used for epitaxial growth of silicon and gallium arsenide materials, metal thin film materials, surface insulation layers, hardening layers, etc. It is also used for the deposition of functional thin films and superhard thin films such as oxides, carbides, diamond like materials, etc. It is also used for the synthesis of powders, block materials, fibers, etc., and has become an important material synthesis method in many industrial fields such as electronics and machinery.

Early this morning, our Tianshi after-sales engineer went to the school to help teachers install and debug the CVD system.

The installation and debugging went very smoothly

````````````````````````````````````````````````````````````````````````````````````````````````````````````````````````````````````````````

After sales of Kejing series products in Shanghai area, welcome teachers to make appointments!