Microscopic spectrophotometer is a high-precision optical measuring instrument mainly used for non-destructive and non-contact measurement of the thickness of thin films, chips, optical materials, and multilayer films, and analysis of their optical constants (such as refractive index and extinction coefficient). Based on the principles of light interference and spectroscopy. When light shines on the surface of the film, it will reflect multiple times between the front and rear surfaces of the film, forming interference fringes. By using spectroscopic techniques, these interference fringes are decomposed into spectra of different wavelengths, and their intensity distribution is measured. Then, relevant algorithms are used to calculate parameters such as the thickness and refractive index of the thin film.
The microspectroscopy film thickness analyzer measures absolute reflectance in small areas using microspectroscopy. When light shines on the surface of the film, reflection and transmission phenomena occur, and the light is reflected multiple times on the front and back surfaces of the film to form interference fringes. Spectral analysis technology decomposes these interference fringes into spectra of different wavelengths and measures their intensity distribution, thereby calculating parameters such as the thickness, refractive index (n), and extinction coefficient (k) of the thin film.
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High precision measurement: Using precise algorithms to achieve sub nanometer level film thickness measurement, ensuring the accuracy and reliability of the results. Meet the measurement requirements of thin films with different thicknesses.
Non contact measurement: During the measurement process, there is no need to directly contact the sample to avoid damage caused by external forces and protect the integrity of the sample. Suitable for measuring valuable or fragile thin film materials such as semiconductor wafers and optical coatings.
Fast measurement and real-time display: Measurement time is as short as 1 second per point, supporting high-speed automated scanning to improve detection efficiency. Real time display of film thickness data for quick analysis.
Wide wavelength range and multilayer film analysis: The optical system covers the ultraviolet to near-infrared band (such as 230-1600nm), adapting to the spectral characteristics of different materials. Support multi-layer film structure analysis, capable of simultaneously measuring the thickness and optical constants of multi-layer thin films.
User friendly design: Equipped with software guides that are easy to analyze, even first-time users can quickly complete optical constant analysis. The independent measuring head supports customized requirements and adapts to online monitoring scenarios of different production lines.