In a vacuum chamber, gases (such as oxygen, argon, carbon tetrafluoride, etc.) are ionized into plasma through radio frequency or microwave excitation. High energy ions in plasma can physically bombard and strip surface pollutants, while active free radicals react chemically with pollutants to generate volatile gases, thus achieving the purpose of cleaning. At the same time, plasma can also break the chemical bonds on the material surface, form active sites, and achieve surface activation.

Plasma vacuum cleaning machineAdvantages:

Efficient and environmentally friendly:

The entire processing process does not require water or chemical solvents, avoiding secondary pollution and meeting environmental protection requirements.

High cleaning efficiency, processing can be completed within a few minutes, improving production efficiency.

Wide processing range:

Suitable for various materials such as metal, plastic, ceramic, glass, etc., including polymer materials such as polypropylene, polyvinyl chloride, polytetrafluoroethylene, etc.

Can handle complex shaped samples to meet diverse needs.

Surface modification function:

Cleaning simultaneously achieves surface activation, improving material hydrophilicity, adhesion, and other properties.

By introducing functional groups (such as alkyl, amino, carboxyl) to improve surface chemical properties and enhance material functionality.

Low temperature treatment:

The processing temperature is as low as80°Ceven50°CBelow, avoid damage to heat sensitive materials.

Cost effectiveness:

The equipment has low operating costs and can24Working continuously for hours without the need for manual supervision.

Avoiding additional costs such as transportation, storage, and discharge of cleaning solution, the overall cost is lower than traditional wet cleaning.