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How to achieve ultra-high purity water quality in semiconductor ultrapure water equipment?
Date: 2025-08-08Read: 3
In the field of semiconductor manufacturing, ultrapure water is a key raw material, and its purity directly affects the performance and yield of chips. Semiconductor ultrapure water equipment ensures that the water quality meets ultra-high purity standards through a series of complex process flows and technical means. The following are the main implementation methods:
1、 Preprocessing stage
Pre treatment is the first step in the preparation of ultrapure water, with the main purpose of removing suspended solids, particulate matter, microorganisms, organic matter, and some ions from the water. The pretreatment process usually includes the following steps:
1. Raw water tank and pump: store raw water and provide stable water supply pressure.
2. Quartz sand filter: removes large suspended particles in water through physical filtration.
3. Activated carbon filter: adsorbs organic matter, chlorine and other impurities in water, reducing the chemical oxygen demand (COD) of water.
4. Softener: uses ion exchange resin to remove hardness ions such as calcium and magnesium from water, preventing subsequent equipment scaling.
5. Security filter: further removes small particles from the water to ensure the quality of water entering the subsequent system.
2、 Main processing stage
In the main processing stage, ultra pure water equipment adopts various advanced water treatment technologies to further purify water quality:
1. Reverse osmosis (RO) technology: It separates water molecules from dissolved salts, organic matter, microorganisms and other impurities under high pressure through a semi permeable membrane, with a removal rate of over 99%. This technology can effectively reduce the conductivity and total dissolved solids (TDS) of water.
2. Electrodeionization (EDI) technology: EDI technology combines ion exchange resin and electrodialysis technology, using the action of an electric field to orient the migration of ions in water and adsorb them onto the resin, thereby further removing ions from water. The EDI system can increase the electrical resistivity of water to over 15M Ω· cm.
3. Ion exchange resin: After EDI, ion exchange resin is usually used for deep desalination treatment to further improve the purity of water quality. Ion exchange resin can adsorb trace ions in water, making the electrical resistivity of the produced water reach 18M Ω· cm or even higher.
3、 Precision processing stage
The precision processing stage is to ensure that the water quality meets the ultra-high purity standards required for semiconductor production, usually including the following steps:
1. Polishing mixed bed: The polishing mixed bed is the final step in the preparation of ultrapure water, which further removes trace impurities from the water through high-purity ion exchange resin, ensuring that the electrical resistivity of the produced water reaches 18.2M Ω· cm.
2. UV disinfection: UV disinfection technology is used to kill bacteria and microorganisms in water, ensuring the biological safety of water quality.
3. TOC removal: Organic carbon in water is removed using TOC-UV lamp devices or activated carbon filters to ensure that the total organic carbon (TOC) content in the water is below 1 ppb.
4. Degassing treatment: In the production process of semiconductor ultrapure water, the removal of dissolved oxygen and carbon dioxide is very important. Usually, a degassing device is installed after EDI or before polishing the mixed bed, using a combination of high-purity nitrogen blowing and vacuum mode to reduce the dissolved oxygen in water to below 10 ppb or even lower.
4、 Water quality monitoring and automation control
Semiconductor ultrapure water equipment is usually equipped with advanced water quality monitoring systems and automated control systems. These systems can monitor water quality parameters in real-time, such as resistivity, TOC, pH value, etc., and automatically adjust the operating status of the equipment based on the monitoring results to ensure the stability and reliability of water quality. The automation control system can also achieve automatic start stop, fault alarm, and remote monitoring of equipment, improving the operational efficiency and management level of the equipment.
Through the synergistic effect of the above multi-stage processes, semiconductor ultrapure water equipment can effectively remove various impurities from water, ensuring that the water quality meets ultra-high purity standards and meets the strict requirements of semiconductor production for water quality. This high-purity water quality is crucial for processes such as cleaning, etching, and photolithography in semiconductor manufacturing, and can effectively improve the performance and yield of chips.